Inventor
HOFFMAN JOE G
US25 patents
⚠️ This page may combine multiple inventors who share the name “HOFFMAN JOE G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIR LIQUIDE AMERICAN
9 patentsUS6050283AApr 18, 2000
System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing
AIR LIQUIDE AMERICAN100 citations96
US6350425B2Feb 26, 2002
On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
AIR LIQUIDE AMERICAN23 citations92
US6001223ADec 14, 1999
On-site ammonia purification for semiconductor manufacture
AIR LIQUIDE AMERICAN32 citations92
US6471735B1Oct 29, 2002
Compositions for use in a chemical-mechanical planarization process
AIR LIQUIDE AMERICAN31 citations91
US6063356AMay 16, 2000
On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
AIR LIQUIDE AMERICAN9 citations74
US6015477AJan 18, 2000
Point-of-use ammonia purification for electronic component manufacture
AIR LIQUIDE AMERICAN8 citations74
US6372022B1Apr 16, 2002
Ionic purifier
AIR LIQUIDE AMERICAN11 citations73
USRE37972EFeb 4, 2003
Manufacture of high precision electronic components with ultra-high purity liquids
AIR LIQUIDE AMERICAN6 citations72
US6537516B2Mar 25, 2003
Integrated method of preconditioning a resin for hydrogen peroxide purification and purifying hydrogen peroxide
AIR LIQUIDE AMERICAN1 citations39
STARTEC VENTURES INC
6 patentsUS5496778AMar 5, 1996
Point-of-use ammonia purification for electronic component manufacture
STARTEC VENTURES INC57 citations95
US5242468ASep 7, 1993
Manufacture of high precision electronic components with ultra-high purity liquids
STARTEC VENTURES INC55 citations94
US5785820AJul 28, 1998
On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
STARTEC VENTURES INC30 citations92
US5755934AMay 26, 1998
Point-of-use ammonia purification for electronic component manufacture
STARTEC VENTURES INC17 citations92
US5722442AMar 3, 1998
On-site generation of ultra-high-purity buffered-HF for semiconductor processing
STARTEC VENTURES INC43 citations92
US5846386ADec 8, 1998
On-site ammonia purification for semiconductor manufacture
STARTEC VENTURES INC21 citations86
ATHENS CORP
3 patentsUS5354428AOct 11, 1994
Apparatus for the continuous on-site chemical reprocessing of ultrapure liquids
ATHENS CORP62 citations94
US5164049ANov 17, 1992
Method for making ultrapure sulfuric acid
ATHENS CORP59 citations94
US4828660AMay 9, 1989
Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids
ATHENS CORP53 citations91
AIR LIQUIDE ELECTRONICS CHEMIC
3 patentsUS5846387ADec 8, 1998
On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
AIR LIQUIDE ELECTRONICS CHEMIC30 citations91
USRE36290ESep 7, 1999
Manufacture of high precision electronic components with ultra-high purity liquids
AIR LIQUIDE ELECTRONICS CHEMIC15 citations79
US6214173B1Apr 10, 2001
On-site manufacture of ultra-high-purity nitric acid
AIR LIQUIDE ELECTRONICS CHEMIC12 citations72