Inventor
ASAI SATORU
JP34 patents
⚠️ This page may combine multiple inventors who share the name “ASAI SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
14 patentsUS5465220ANov 7, 1995
Optical exposure method
FUJITSU LTD55 citations96
US6045976AApr 4, 2000
Optical exposure method
FUJITSU LTD29 citations92
US5818078AOct 6, 1998
Semiconductor device having a regrowth crystal region
FUJITSU LTD20 citations92
US5607821AMar 4, 1997
Optical exposure method
FUJITSU LTD18 citations92
US6420094B1Jul 16, 2002
Optical exposure method
FUJITSU LTD13 citations82
US5424153AJun 13, 1995
Optical mask using phase shift and method of producing the same
FUJITSU LTD12 citations74
US5876877AMar 2, 1999
Patterned mask having a transparent etching stopper layer
FUJITSU LTD10 citations73
US5561010AOct 1, 1996
Phase shift optical mask and method of correcting defects in optical mask
FUJITSU LTD18 citations73
US5418093AMay 23, 1995
Projection exposure method and an optical mask for use in projection exposure
FUJITSU LTD14 citations73
US5368963ANov 29, 1994
Photomask and method of fabricating the same
FUJITSU LTD10 citations73
US7371489B2May 13, 2008
Photomask, method for detecting pattern defect of the same, and method for making pattern using the same
FUJITSU LTD2 citations63
US7074524B2Jul 11, 2006
Photomask, method for detecting pattern defect of the same, and method for making pattern using the same
FUJITSU LTD4 citations63
US5994004ANov 30, 1999
Levenson type phase shift photomask and manufacture method of semiconductor device using such photomask
FUJITSU LTD3 citations62
US5428478AJun 27, 1995
Optical mask and exposure method using the optical mask
FUJITSU LTD6 citations62
TOSHIBA KK
4 patentsUS6499946B1Dec 31, 2002
Steam turbine rotor and manufacturing method thereof
TOSHIBA KK74 citations94
US7144303B2Dec 5, 2006
Method of polishing a large part and abrasive for use in the method
TOSHIBA KK7 citations71
US7455570B2Nov 25, 2008
Large part polishing apparatus and polishing method
TOSHIBA KK6 citations60
US9841279B2Dec 12, 2017
Apparatus and method for quantitative evaluation of braze bonding length with use of radiation
TOSHIBA KK0 citations35
DENSO CORP
3 patentsFUJITSU MICROELECTRONICS LTD
3 patentsUS7601471B2Oct 13, 2009
Apparatus and method for correcting pattern dimension and photo mask and test photo mask
FUJITSU MICROELECTRONICS LTD5 citations62
US7577556B2Aug 18, 2009
Method and equipment for simulation
FUJITSU MICROELECTRONICS LTD5 citations62
US7604912B2Oct 20, 2009
Local flare correction
FUJITSU MICROELECTRONICS LTD1 citations51
FUJITSU SEMICONDUCTOR LTD
2 patentsUS7971160B2Jun 28, 2011
Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask
FUJITSU SEMICONDUCTOR LTD164 citations98
US7732107B2Jun 8, 2010
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
FUJITSU SEMICONDUCTOR LTD3 citations60
YAO TERUYOSHI
2 patentsUS8553198B2Oct 8, 2013
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
YAO TERUYOSHI0 citations45
US8227153B2Jul 24, 2012
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
YAO TERUYOSHI0 citations45