Inventor
HATA JIRO
JP17 patents
Patents
17 patentsUS5571366ANov 5, 1996
Plasma processing apparatus
TOKYO ELECTRON LTD502 citations99
US5413958AMay 9, 1995
Method for manufacturing a liquid crystal display substrate
TOKYO ELECTRON LTD208 citations99
US5372836ADec 13, 1994
Method of forming polycrystalling silicon film in process of manufacturing LCD
TOKYO ELECTRON LTD163 citations99
US5531834AJul 2, 1996
Plasma film forming method and apparatus and plasma processing apparatus
TOKYO ELECTRON LTD161 citations98
US5529630AJun 25, 1996
Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals
TOKYO ELECTRON LTD122 citations98
US5525159AJun 11, 1996
Plasma process apparatus
TOKYO ELECTRON LTD194 citations98
US5522934AJun 4, 1996
Plasma processing apparatus using vertical gas inlets one on top of another
TOKYO ELECTRON LTD322 citations98
US5792261AAug 11, 1998
Plasma process apparatus
TOKYO ELECTRON LTD94 citations97
US5476182ADec 19, 1995
Etching apparatus and method therefor
TOKYO ELECTRON LTD66 citations96
US6350347B1Feb 26, 2002
Plasma processing apparatus
TOKYO ELECTRON LTD14 citations92
US6136139AOct 24, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD22 citations92
USRE36371ENov 2, 1999
Method of forming polycrystalline silicon film in process of manufacturing LCD
TOKYO ELECTRON LTD22 citations92
USRE39020EMar 21, 2006
Plasma process apparatus
TOKYO ELECTRON LTD12 citations84
US6265031B1Jul 24, 2001
Method for plasma processing by shaping an induced electric field
TOKYO ELECTRON LTD12 citations82
US5938883AAug 17, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD16 citations82
US6136140AOct 24, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD15 citations74
USRE40963ENov 10, 2009
Method for plasma processing by shaping an induced electric field
TOKYO ELECTRON LTD1 citations52