Inventor
IMAHASHI ISSEI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “IMAHASHI ISSEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS5695564ADec 9, 1997
Semiconductor processing system
TOKYO ELECTRON LTD445 citations99
US5571366ANov 5, 1996
Plasma processing apparatus
TOKYO ELECTRON LTD502 citations99
US5413958AMay 9, 1995
Method for manufacturing a liquid crystal display substrate
TOKYO ELECTRON LTD208 citations99
US5372836ADec 13, 1994
Method of forming polycrystalling silicon film in process of manufacturing LCD
TOKYO ELECTRON LTD163 citations99
US5338362AAug 16, 1994
Apparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartments
TOKYO ELECTRON LTD598 citations99
US5554223ASep 10, 1996
Plasma processing apparatus with a rotating electromagnetic field
TOKYO ELECTRON LTD144 citations98
US5529630AJun 25, 1996
Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals
TOKYO ELECTRON LTD122 citations98
US5342472AAug 30, 1994
Plasma processing apparatus
TOKYO ELECTRON LTD118 citations98
US5537004AJul 16, 1996
Low frequency electron cyclotron resonance plasma processor
TOKYO ELECTRON LTD63 citations96
US5414244AMay 9, 1995
Semiconductor wafer heat treatment apparatus
TOKYO ELECTRON LTD70 citations96
US5374327ADec 20, 1994
Plasma processing method
TOKYO ELECTRON LTD48 citations93
US5173641ADec 22, 1992
Plasma generating apparatus
TOKYO ELECTRON LTD35 citations93
US6284668B1Sep 4, 2001
Plasma polishing method
TOKYO ELECTRON LTD28 citations92
USRE36371ENov 2, 1999
Method of forming polycrystalline silicon film in process of manufacturing LCD
TOKYO ELECTRON LTD22 citations92
US5198755AMar 30, 1993
Probe apparatus
TOKYO ELECTRON LTD17 citations74
US5004924AApr 2, 1991
Wafer transport apparatus for ion implantation apparatus
TOKYO ELECTRON LTD11 citations74
US4873447AOct 10, 1989
Wafer transport apparatus for ion implantation apparatus
TOKYO ELECTRON LTD7 citations74
US6431114B1Aug 13, 2002
Method and apparatus for plasma processing
TOKYO ELECTRON LTD8 citations72
TELMEC CO LTD
6 patentsUS4525659AJun 25, 1985
Positioning stage having a vibration suppressor
TELMEC CO LTD102 citations96
US4377028AMar 22, 1983
Method for registering a mask pattern in a photo-etching apparatus for semiconductor devices
TELMEC CO LTD40 citations92
US4441250AApr 10, 1984
Apparatus for registering a mask pattern in a photo-etching apparatus for semiconductor devices
TELMEC CO LTD11 citations74
US4397078AAug 9, 1983
Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits
TELMEC CO LTD18 citations74
US4390827AJun 28, 1983
Linear motor
TELMEC CO LTD7 citations74
US4347452AAug 31, 1982
Micro-displacement device
TELMEC CO LTD8 citations74