Inventor
FUKASAWA TAKAYUKI
KR46 patents
⚠️ This page may combine multiple inventors who share the name “FUKASAWA TAKAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
20 patentsUS5964320AOct 12, 1999
Brake shoe for elevator emergency stop
TOSHIBA KK47 citations92
US5367468ANov 22, 1994
Design aid method and design aid apparatus for integrated circuits
TOSHIBA KK42 citations92
US7435274B2Oct 14, 2008
Metal particle-dispersed composite oxides, metal particle-dispersed composite oxide-sintered bodies, method of manufacturing metal particle-dispersed composite oxides, and hydrocarbon-based fuel reformer
TOSHIBA KK12 citations84
US7005405B2Feb 28, 2006
Metal oxide sintered structure and production method therefor
TOSHIBA KK17 citations83
US6093366AJul 25, 2000
Method of manufacturing ceramic sintered bodies
TOSHIBA KK10 citations74
US10615410B2Apr 7, 2020
Active material for nonaqueous electrolyte battery, electrode for nonaqueous electrolyte battery, nonaqueous electrolyte secondary battery, battery pack, method of manufacturing active material for nonaqueous electrolyte battery, and vehicle
TOSHIBA KK4 citations73
US10326129B2Jun 18, 2019
Active material, electrode, nonaqueous electrolyte secondary battery, battery pack and production method of active material
TOSHIBA KK4 citations73
US9859553B2Jan 2, 2018
Negative electrode active material for nonaqueous electrolyte secondary battery, nonaqueous electrolyte secondary battery, and battery pack
TOSHIBA KK3 citations73
US9859552B2Jan 2, 2018
Electrode material for nonaqueous electrolyte secondary battery, electrode for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery
TOSHIBA KK5 citations72
US9306221B2Apr 5, 2016
Fuel electrodes for solid oxide electrochemical cell, processes for producing the same, and solid oxide electrochemical cells
TOSHIBA KK4 citations71
US11512023B2Nov 29, 2022
Silicon nitride substrate and silicon nitride circuit board
TOSHIBA KK2 citations69
US10511026B2Dec 17, 2019
Electrode for nonaqueous electrolyte secondary battery, nonaqueous electrolyte secondary battery, battery pack, and vehicle
TOSHIBA KK1 citations62
US12187651B2Jan 7, 2025
Silicon nitride sintered body, silicon nitride substrate, and silicon nitride circuit board
TOSHIBA KK0 citations59
US10381649B2Aug 13, 2019
Electrode material for nonaqueous electrolyte battery, electrode for nonaqueous electrolyte battery, nonaqueous electrolyte battery including the same, and battery pack
TOSHIBA KK0 citations52
US10005078B2Jun 26, 2018
Fuel synthesis catalyst and fuel synthesis system
TOSHIBA KK0 citations52
US8999600B2Apr 7, 2015
Solid oxide electrochemical cell
TOSHIBA KK0 citations51
US9975099B2May 22, 2018
Fuel synthesis catalyst and fuel synthesis system
TOSHIBA KK0 citations42
US10693128B2Jun 23, 2020
Electrode for nonaqueous electrolyte battery, nonaqueous electrolyte battery including the same, and battery pack
TOSHIBA KK0 citations41
US9318737B2Apr 19, 2016
Negative electrode material for non-aqueous electrolyte secondary battery, negative electrode active material for non-aqueous electrolyte secondary battery, and non-aqueous electrolyte secondary battery
TOSHIBA KK0 citations39
US10468669B2Nov 5, 2019
Active material for nonaqueous electrolyte battery, electrode for nonaqueous electrolyte battery, nonaqueous electrolyte secondary battery and battery pack
TOSHIBA KK0 citations37
SAMSUNG DISPLAY CO LTD
17 patentsUS9543444B2Jan 10, 2017
Oxide sputtering target, and thin film transistor using the same
SAMSUNG DISPLAY CO LTD7 citations84
US9246377B2Jan 26, 2016
Apparatus for transferring substrate
SAMSUNG DISPLAY CO LTD17 citations84
US11772191B2Oct 3, 2023
Substrate processing apparatus and method
SAMSUNG DISPLAY CO LTD0 citations62
US11386843B2Jul 12, 2022
Display device and manufacturing method thereof
SAMSUNG DISPLAY CO LTD0 citations62
US10698280B2Jun 30, 2020
Display device and method of manufacturing the same
SAMSUNG DISPLAY CO LTD1 citations62
US12398458B2Aug 26, 2025
Sputtering device
SAMSUNG DISPLAY CO LTD0 citations52
US11716477B2Aug 1, 2023
Display device
SAMSUNG DISPLAY CO LTD0 citations52
US11195880B2Dec 7, 2021
Display apparatus and manufacturing method thereof
SAMSUNG DISPLAY CO LTD0 citations52
US10943963B2Mar 9, 2021
Display device
SAMSUNG DISPLAY CO LTD0 citations52
US10539821B2Jan 21, 2020
Optical film movable around a display panel and a display apparatus including the same
SAMSUNG DISPLAY CO LTD0 citations52
US10032927B2Jul 24, 2018
Oxide sputtering target, and thin film transistor using the same
SAMSUNG DISPLAY CO LTD0 citations52
US9722089B2Aug 1, 2017
Thin film transistor array panel and manufacturing method thereof
SAMSUNG DISPLAY CO LTD0 citations52
US9530622B2Dec 27, 2016
Sputtering device and gas supply pipe for sputtering device
SAMSUNG DISPLAY CO LTD1 citations52
US9484200B2Nov 1, 2016
Oxide sputtering target, thin film transistor using the same, and method for manufacturing thin film transistor
SAMSUNG DISPLAY CO LTD0 citations52
US9001490B2Apr 7, 2015
Substrate fixing device and method for manufacturing the same
SAMSUNG DISPLAY CO LTD0 citations52
US9266186B2Feb 23, 2016
Apparatus and method of treating substrate
SAMSUNG DISPLAY CO LTD0 citations45
US9644270B2May 9, 2017
Oxide semiconductor depositing apparatus and method of manufacturing oxide semiconductor using the same
SAMSUNG DISPLAY CO LTD0 citations41
TOKYO ELECTRON LTD
5 patentsUS5487785AJan 30, 1996
Plasma treatment apparatus
TOKYO ELECTRON LTD152 citations99
US5537004AJul 16, 1996
Low frequency electron cyclotron resonance plasma processor
TOKYO ELECTRON LTD63 citations96
US5413663AMay 9, 1995
Plasma processing apparatus
TOKYO ELECTRON LTD28 citations93
US6096176AAug 1, 2000
Sputtering method and a sputtering apparatus thereof
TOKYO ELECTRON LTD11 citations74
US7192532B2Mar 20, 2007
Dry etching method
TOKYO ELECTRON LTD0 citations50