Inventor
SHERSTINSKY SEMYON
US29 patents
⚠️ This page may combine multiple inventors who share the name “SHERSTINSKY SEMYON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
28 patentsUS5745331AApr 28, 1998
Electrostatic chuck with conformal insulator film
APPLIED MATERIALS INC166 citations99
US5326725AJul 5, 1994
Clamping ring and susceptor therefor
APPLIED MATERIALS INC166 citations98
US7480129B2Jan 20, 2009
Detachable electrostatic chuck for supporting a substrate in a process chamber
APPLIED MATERIALS INC87 citations97
US6464795B1Oct 15, 2002
Substrate support member for a processing chamber
APPLIED MATERIALS INC98 citations97
US7244344B2Jul 17, 2007
Physical vapor deposition plasma reactor with VHF source power applied through the workpiece
APPLIED MATERIALS INC34 citations96
US6837968B2Jan 4, 2005
Lower pedestal shield
APPLIED MATERIALS INC40 citations96
US6726805B2Apr 27, 2004
Pedestal with integral shield
APPLIED MATERIALS INC56 citations96
US6652713B2Nov 25, 2003
Pedestal with integral shield
APPLIED MATERIALS INC47 citations96
US5985033ANov 16, 1999
Apparatus and method for delivering a gas
APPLIED MATERIALS INC57 citations96
US5883778AMar 16, 1999
Electrostatic chuck with fluid flow regulator
APPLIED MATERIALS INC68 citations96
US5753132AMay 19, 1998
Method of making electrostatic chuck with conformal insulator film
APPLIED MATERIALS INC78 citations96
US5421401AJun 6, 1995
Compound clamp ring for semiconductor wafers
APPLIED MATERIALS INC69 citations96
US6464790B1Oct 15, 2002
Substrate support member
APPLIED MATERIALS INC126 citations95
US6350320B1Feb 26, 2002
Heater for processing chamber
APPLIED MATERIALS INC293 citations95
US5740009AApr 14, 1998
Apparatus for improving wafer and chuck edge protection
APPLIED MATERIALS INC117 citations95
US5292399AMar 8, 1994
Plasma etching apparatus with conductive means for inhibiting arcing
APPLIED MATERIALS INC123 citations95
US6557248B1May 6, 2003
Method of fabricating an electrostatic chuck
APPLIED MATERIALS INC47 citations94
US7907384B2Mar 15, 2011
Detachable electrostatic chuck for supporting a substrate in a process chamber
APPLIED MATERIALS INC13 citations92
US7697260B2Apr 13, 2010
Detachable electrostatic chuck
APPLIED MATERIALS INC35 citations92
US7252737B2Aug 7, 2007
Pedestal with integral shield
APPLIED MATERIALS INC22 citations92
US6248176B1Jun 19, 2001
Apparatus and method for delivering a gas
APPLIED MATERIALS INC28 citations92
US6123864ASep 26, 2000
Etch chamber
APPLIED MATERIALS INC21 citations92
US5671117ASep 23, 1997
Electrostatic chuck
APPLIED MATERIALS INC27 citations92
US5634266AJun 3, 1997
Method of making a dielectric chuck
APPLIED MATERIALS INC23 citations92
US5673922AOct 7, 1997
Apparatus for centering substrates on support members
APPLIED MATERIALS INC52 citations91
US6278600B1Aug 21, 2001
Electrostatic chuck with improved temperature control and puncture resistance
APPLIED MATERIALS INC46 citations90
US5316278AMay 31, 1994
Clamping ring apparatus for processing semiconductor wafers
APPLIED MATERIALS INC29 citations90
US6270621B1Aug 7, 2001
Etch chamber
APPLIED MATERIALS INC9 citations73