P

Inventor

HIROTA TOSHIYUKI

JP71 patents
⚠️ This page may combine multiple inventors who share the name “HIROTA TOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NEC CORP

25 patents
US5445986AAug 29, 1995

Method of forming a roughened surface capacitor with two etching steps

NEC CORP119 citations98
US6316329B1Nov 13, 2001

Forming a trench mask comprising a DLC and ASH protecting layer

NEC CORP67 citations96
US5959326ASep 28, 1999

Capacitor incorporated in semiconductor device having a lower electrode composed of multi-layers or of graded impurity concentration

NEC CORP88 citations96
US5372962ADec 13, 1994

Method of making a semiconductor integrated circuit device having a capacitor with a porous surface of an electrode

NEC CORP106 citations95
US6376328B1Apr 23, 2002

Method for producing capacitor elements, and capacitor element

NEC CORP28 citations93
US5863602AJan 26, 1999

Method for capturing gaseous impurities and semiconductor device manufacturing apparatus

NEC CORP37 citations93
US5858852AJan 12, 1999

Fabrication process of a stack type semiconductor capacitive element

NEC CORP21 citations93
US5616511AApr 1, 1997

Method of fabricating a micro-trench storage capacitor

NEC CORP32 citations93
US5567637AOct 22, 1996

Method of fabricating a micro-trench floating gate electrode for flash memory cell

NEC CORP27 citations93
US5464791ANov 7, 1995

Method of fabricating a micro-trench storage capacitor

NEC CORP32 citations93
US5938857AAug 17, 1999

Method for rinsing and drying a substrate

NEC CORP31 citations92
US5926709AJul 20, 1999

Process of fabricating miniature memory cell having storage capacitor with wide surface area

NEC CORP33 citations92
US5858834AJan 12, 1999

Method for forming cylindrical capacitor lower plate in semiconductor device

NEC CORP21 citations92
US6228702B1May 8, 2001

Method of manufacturing semiconductor device

NEC CORP17 citations84
US5953608ASep 14, 1999

Method of forming a DRAM stacked capacitor using an etch blocking film of silicon oxide

NEC CORP19 citations84
US6399439B1Jun 4, 2002

Method for manufacturing semiconductor device

NEC CORP14 citations83
US6346480B2Feb 12, 2002

Method for forming aluminum interconnection

NEC CORP6 citations74
US6300186B1Oct 9, 2001

Method of measuring semiconductor device

NEC CORP7 citations74
US6248625B1Jun 19, 2001

Manufacturing method of cylindrical-capacitor lower electrode

NEC CORP7 citations74
US6218230B1Apr 17, 2001

Method for producing capacitor having hemispherical grain

NEC CORP12 citations74
US6187623B1Feb 13, 2001

Method of manufacturing semiconductor device

NEC CORP8 citations74
US6146966ANov 14, 2000

Process for forming a capacitor incorporated in a semiconductor device

NEC CORP12 citations74
US6087212AJul 11, 2000

Method for forming a storage node in a semiconductor memory

NEC CORP7 citations74
US6046082AApr 4, 2000

Method for manufacturing semiconductor device

NEC CORP9 citations74
US5597760AJan 28, 1997

Process of fabricating semiconductor device having capacitor increased in capacitance by roughening surface of accumulating electrode

NEC CORP16 citations74

TOSHIBA KK

9 patents

ELPIDA MEMORY INC

6 patents

HIROTA TOSHIYUKI

2 patents

DYNABOOK INC

2 patents

SHANKER SUNIL

1 patent

MALHOTRA SANDRA

1 patent

NEC ELECTRONICS CORP

1 patent

PS4 LUXCO SARL

1 patent

CALSONIC KANSEI NORTH AMERICA INC

1 patent

INTERMOLECULAR INC

1 patent

Showing the top 50 of 71 patents by PatentIndex Score.