Inventor
HEIDEN MICHAEL
DE21 patents
⚠️ This page may combine multiple inventors who share the name “HEIDEN MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VISTEC SEMICONDUCTOR SYS GMBH
14 patentsUS7694426B2Apr 13, 2010
Method for eliminating sources of error in the system correction of a coordinate measuring machine
VISTEC SEMICONDUCTOR SYS GMBH9 citations83
US7986409B2Jul 26, 2011
Method for determining the centrality of masks
VISTEC SEMICONDUCTOR SYS GMBH2 citations62
US7903259B2Mar 8, 2011
Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device
VISTEC SEMICONDUCTOR SYS GMBH5 citations62
US7889338B2Feb 15, 2011
Coordinate measuring machine and method for structured illumination of substrates
VISTEC SEMICONDUCTOR SYS GMBH2 citations62
US7680616B2Mar 16, 2010
Method for correcting an error of the imaging system of a coordinate measuring machine
VISTEC SEMICONDUCTOR SYS GMBH2 citations62
US7382450B2Jun 3, 2008
Method of detecting an edge bead removal line on a wafer
VISTEC SEMICONDUCTOR SYS GMBH4 citations62
US7654007B2Feb 2, 2010
Method for improving the reproducibility of a coordinate measuring apparatus and its accuracy
VISTEC SEMICONDUCTOR SYS GMBH4 citations61
US7769556B2Aug 3, 2010
Method for correcting measuring errors caused by the lens distortion of an objective
VISTEC SEMICONDUCTOR SYS GMBH2 citations60
US7545489B2Jun 9, 2009
Apparatus and method of inspecting the surface of a wafer
VISTEC SEMICONDUCTOR SYS GMBH2 citations59
US7978340B2Jul 12, 2011
System and method for determining positions of structures on a substrate
VISTEC SEMICONDUCTOR SYS GMBH1 citations49
US7929149B2Apr 19, 2011
Coordinate measuring machine and a method for correcting non-linearities of the interferometers of a coordinate measuring machine
VISTEC SEMICONDUCTOR SYS GMBH0 citations41
US7939789B2May 10, 2011
Method for reproducibly determining geometrical and/or optical object characteristics
VISTEC SEMICONDUCTOR SYS GMBH0 citations40
US7561263B2Jul 14, 2009
Apparatus for illuminating and inspecting a surface
VISTEC SEMICONDUCTOR SYS GMBH0 citations40
US7961334B2Jun 14, 2011
Coordinate measuring machine for measuring structures on a substrate
VISTEC SEMICONDUCTOR SYS GMBH0 citations39
HEIDEN MICHAEL
4 patentsUS8582113B2Nov 12, 2013
Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device
HEIDEN MICHAEL3 citations60
US8390927B2Mar 5, 2013
Element for homogenizing the illumination with simultaneous setting of the polarization degree
HEIDEN MICHAEL3 citations60
US8305587B2Nov 6, 2012
Apparatus for the optical inspection of wafers
HEIDEN MICHAEL4 citations60
US8102541B2Jan 24, 2012
Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures
HEIDEN MICHAEL0 citations50