Inventor

FUCSKO JANOS

US44 patents

⚠️ This page may combine multiple inventors who share the name “FUCSKO JANOS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUCSKO JANOS

MICRON TECHNOLOGY INC

Low temperature process for polysilazane oxidation/densification

Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum

Methods of shaping vertical single crystal silicon walls and resulting structures

Wet etch suitable for creating square cuts in si

Low temperature process for polysilazane oxidation/densification

Isolation trenches for memory devices

Wet etching method of removing silicon from a substrate

Semiconductor structures including square cuts in single crystal silicon

Semiconductor processing methods

Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry

Method of removing silicon from a substrate

Methods of forming memory arrays

Methods of forming semiconductor constructions, and methods of forming isolation regions

Method of forming trench isolation within a semiconductor substrate

Semiconductor constructions, memory arrays, electronic systems, and methods of forming semiconductor constructions

Semiconductor constructions, memory arrays, electronic systems, and methods of forming semiconductor constructions

Memory arrays

Semiconductor constructions

Wet etching method of removing silicon from a substrate and method of forming trench isolation

Etching processes for integrated circuit manufacturing including methods of forming capacitors

Etch compositions and methods of processing a substrate

Etch compositions and methods of processing a substrate

Semiconductor structure formation

Electronic systems and methods of forming semiconductor constructions

Memory arrays

Memory arrays

Methods of etching oxide, reducing roughness, and forming capacitor constructions

Method of forming trench isolation

Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substrates

Method of substantially uniformly etching non-homogeneous substrates

FUCSKO JANOS

Low temperature process for polysilazane oxidation/densification

Single crystal silicon structures

Methods of forming single crystal silicon structures and semiconductor device structures including single crystal silicon structures

Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substrates

TANG SANH D

Integrated memory arrays

Methods of forming memory arrays

Methods of forming memory arrays

LEE WHONCHEE

Methods of etching single crystal silicon

Semiconductor structures including square cuts in single crystal silicon and method of forming same

SAPRA SANJEEV

Methods of removing a metal nitride material

Semiconductor device structures and compositions for forming same

HANSON ROBERT J

Methods of forming oxides, methods of forming semiconductor constructions, and methods of forming isolation regions

BIAN ZAILONG

Memory arrays

RANA NIRAJ B

Methods of etching oxide, reducing roughness, and forming capacitor constructions