Inventor
FURUKAWA KIKUO
JP16 patents
⚠️ This page may combine multiple inventors who share the name “FURUKAWA KIKUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI GAS CHEMICAL CO
14 patentsUS7078562B2Jul 18, 2006
Adamantane derivatives and resin compositions using the same as raw material
MITSUBISHI GAS CHEMICAL CO52 citations92
US9951163B2Apr 24, 2018
(Meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same
MITSUBISHI GAS CHEMICAL CO2 citations71
US6521781B2Feb 18, 2003
Production of 2-hydrocarbyl-2-adamantyl acrylate compounds
MITSUBISHI GAS CHEMICAL CO2 citations62
US11214650B2Jan 4, 2022
Composition for high refractive index low dispersion resins for composite diffractive optical elements, and composite diffractive optical element using the same
MITSUBISHI GAS CHEMICAL CO0 citations60
US11186673B2Nov 30, 2021
Composition for use as optical material
MITSUBISHI GAS CHEMICAL CO0 citations60
US10526452B2Jan 7, 2020
Method for producing cured product of episulfide-based resin
MITSUBISHI GAS CHEMICAL CO1 citations58
US9477151B2Oct 25, 2016
Alicyclic ester compound, and (meth)acrylic copolymer and photosensitive resin composition containing same
MITSUBISHI GAS CHEMICAL CO0 citations51
US6570042B2May 27, 2003
Production of adamantanediols
MITSUBISHI GAS CHEMICAL CO1 citations51
US10005714B2Jun 26, 2018
(Meth)acrylic acid ester compound and production method therefor
MITSUBISHI GAS CHEMICAL CO0 citations50
US10647819B2May 12, 2020
Photocurable composition and optical material
MITSUBISHI GAS CHEMICAL CO0 citations49
US9051256B1Jun 9, 2015
Process for producing hydroxy adamantane carboxylic acid compounds
MITSUBISHI GAS CHEMICAL CO0 citations40
US7067692B2Jun 27, 2006
Production method of adamantyl acrylate compounds
MITSUBISHI GAS CHEMICAL CO0 citations40
US9994513B2Jun 12, 2018
Method for producing novel ali cyclic ester compound, novel alicyclic ester compound, (meth)acrylic copolymer produced by polymerizing said compound, and photosensitive resin composition using said copolymer
MITSUBISHI GAS CHEMICAL CO0 citations39
US9920169B2Mar 20, 2018
Curable composition
MITSUBISHI GAS CHEMICAL CO0 citations36