Inventor
HSIEH TZU-YEN
TW24 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH TZU-YEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
9 patentsUS10665457B2May 26, 2020
Method of forming an integrated circuit using a patterned mask layer
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations84
US9934971B2Apr 3, 2018
Method of forming an integrated circuit using a patterned mask layer
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9923079B2Mar 20, 2018
Composite dummy gate with conformal polysilicon layer for FinFET device
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9640398B2May 2, 2017
Method of forming an integrated circuit using a patterned mask layer
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US11462408B2Oct 4, 2022
Method of forming an integrated circuit using a patterned mask layer
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12027370B2Jul 2, 2024
Method of forming an integrated circuit using a patterned mask layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9054125B2Jun 9, 2015
Method for making semiconductor device with gate profile control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10269581B2Apr 23, 2019
Method of fabricating a semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9779963B2Oct 3, 2017
Method of fabricating a semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
HSIEH TZU-YEN
5 patentsUS8772183B2Jul 8, 2014
Method of forming an integrated circuit
HSIEH TZU-YEN11 citations90
US8680671B2Mar 25, 2014
Self-aligned double patterning for memory and other microelectronic devices
HSIEH TZU-YEN7 citations82
US8691655B2Apr 8, 2014
Method of semiconductor integrated circuit fabrication
HSIEH TZU-YEN0 citations51
US9111861B2Aug 18, 2015
Method of fabricating a semiconductor structure with ion-implanted conductive layer
HSIEH TZU-YEN0 citations50
US8853092B2Oct 7, 2014
Self-aligned patterning with implantation
HSIEH TZU-YEN0 citations40
TAIWAN SEMICONDUCTOR MFG
4 patentsUS9123743B2Sep 1, 2015
FinFETs and methods for forming the same
TAIWAN SEMICONDUCTOR MFG9 citations84
US9059085B2Jun 16, 2015
Method of forming an integrated circuit using a patterned mask layer
TAIWAN SEMICONDUCTOR MFG4 citations83
US9276089B2Mar 1, 2016
FinFETs and methods for forming the same
TAIWAN SEMICONDUCTOR MFG0 citations52
US9147679B2Sep 29, 2015
Method of semiconductor integrated circuit fabrication
TAIWAN SEMICONDUCTOR MFG0 citations52