Inventor
OHASHI MASAKI
JP165 patents
⚠️ This page may combine multiple inventors who share the name “OHASHI MASAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
31 patentsUS9091918B2Jul 28, 2015
Sulfonium salt, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO58 citations98
US7569326B2Aug 4, 2009
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO129 citations98
US10295904B2May 21, 2019
Resist composition and patterning process
SHINETSU CHEMICAL CO43 citations94
US9250518B2Feb 2, 2016
Resist composition and patterning process
SHINETSU CHEMICAL CO35 citations94
US8361693B2Jan 29, 2013
Chemically amplified positive photoresist composition and pattern forming process
SHINETSU CHEMICAL CO32 citations93
US7670751B2Mar 2, 2010
Photoacid generator, resist composition, and patterning process
SHINETSU CHEMICAL CO26 citations93
US7527912B2May 5, 2009
Photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO38 citations93
US11415887B2Aug 16, 2022
Resist composition and patterning process
SHINETSU CHEMICAL CO9 citations86
US10474030B2Nov 12, 2019
Resist composition and patterning process
SHINETSU CHEMICAL CO8 citations84
US10323113B2Jun 18, 2019
Resist composition and patterning process
SHINETSU CHEMICAL CO7 citations84
US10248022B2Apr 2, 2019
Sulfonium compound, making method, resist composition, and pattern forming process
SHINETSU CHEMICAL CO8 citations84
US10180626B2Jan 15, 2019
Sulfonium salt, resist composition, and patterning process
SHINETSU CHEMICAL CO9 citations84
US10173975B2Jan 8, 2019
Sulfonium compound, resist composition, and pattern forming process
SHINETSU CHEMICAL CO8 citations84
US10120279B2Nov 6, 2018
Negative resist composition and resist pattern forming process
SHINETSU CHEMICAL CO8 citations84
US10101653B2Oct 16, 2018
Resist composition and patterning process
SHINETSU CHEMICAL CO7 citations84
US10101654B2Oct 16, 2018
Resist composition and patterning process
SHINETSU CHEMICAL CO12 citations84
US10012902B2Jul 3, 2018
Positive resist composition and pattern forming process
SHINETSU CHEMICAL CO7 citations84
US9897914B2Feb 20, 2018
Resist composition and patterning process
SHINETSU CHEMICAL CO7 citations84
US9221742B2Dec 29, 2015
Sulfonium salt, chemically amplified resist composition, and pattern forming process
SHINETSU CHEMICAL CO7 citations84
US8039198B2Oct 18, 2011
Sulfonium salt-containing polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO12 citations84
US7629108B2Dec 8, 2009
Nitrogen-containing organic compound, resist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US7556909B2Jul 7, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO9 citations84
US7531289B2May 12, 2009
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US11774853B2Oct 3, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO5 citations75
US11560355B2Jan 24, 2023
Onium salt, chemically amplified resist composition, and patterning process
SHINETSU CHEMICAL CO4 citations75
US11281101B2Mar 22, 2022
Resist composition and patterning process
SHINETSU CHEMICAL CO6 citations75
US11693314B2Jul 4, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO4 citations74
US11604411B2Mar 14, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO3 citations73
US11460772B2Oct 4, 2022
Positive resist composition and patterning process
SHINETSU CHEMICAL CO2 citations73
US11460773B2Oct 4, 2022
Resist composition and patterning process
SHINETSU CHEMICAL CO3 citations73
US11435665B2Sep 6, 2022
Resist composition and patterning process
SHINETSU CHEMICAL CO5 citations73
OHASHI MASAKI
5 patentsUS8105748B2Jan 31, 2012
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI81 citations98
US8057985B2Nov 15, 2011
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI52 citations94
US8114571B2Feb 14, 2012
Photoacid generator, resist composition, and patterning process
OHASHI MASAKI29 citations92
US8394570B2Mar 12, 2013
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
OHASHI MASAKI12 citations84
US8283104B2Oct 9, 2012
Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
OHASHI MASAKI14 citations84
OHSAWA YOUICHI
4 patentsUS8785105B2Jul 22, 2014
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
OHSAWA YOUICHI17 citations92
US8173354B2May 8, 2012
Sulfonium salt, resist composition, and patterning process
OHSAWA YOUICHI23 citations92
US8114570B2Feb 14, 2012
Photoacid generator, resist composition, and patterning process
OHSAWA YOUICHI15 citations84
US8062828B2Nov 22, 2011
Positive resist composition and patterning process
OHSAWA YOUICHI11 citations84
HATAKEYAMA JUN
3 patentsTOYODA GOSEI KK
3 patentsSSD CO LTD
1 patentTAKEDA TAKANOBU
1 patentEUDYNA DEVICES INC
1 patentTAKEMURA KATSUYA
1 patentShowing the top 50 of 165 patents by PatentIndex Score.