Inventor
NAGASAKA HIDEKI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “NAGASAKA HIDEKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI CHEM CORP
8 patentsUS6410207B1Jun 25, 2002
Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate
MITSUBISHI CHEM CORP24 citations92
US6326122B1Dec 4, 2001
Positive photosensitive composition, positive photosensitive lithographic plate and method for making positive photosensitive lithographic printing plate
MITSUBISHI CHEM CORP36 citations92
US6074802AJun 13, 2000
Positive photosensitive composition, positive photosensitive lithographic printing plate and method for its treatment
MITSUBISHI CHEM CORP36 citations92
US5814431ASep 29, 1998
Photosensitive composition and lithographic printing plate
MITSUBISHI CHEM CORP44 citations92
US5738974AApr 14, 1998
Photopolymerizable composition and photosensitive lithographic printing plate
MITSUBISHI CHEM CORP26 citations92
US5498641AMar 12, 1996
Polymerizable composition containing pyrromethene type coloring matter and titanocene compound
MITSUBISHI CHEM CORP20 citations91
US6808861B1Oct 26, 2004
Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate
MITSUBISHI CHEM CORP4 citations62
US5607817AMar 4, 1997
Photopolymerizable composition
MITSUBISHI CHEM CORP2 citations60
MITSUBISHI CHEM IND
7 patentsUS4396696AAug 2, 1983
Electrophotographic plate having azo compound photosensitive layer
MITSUBISHI CHEM IND20 citations82
US4725523AFeb 16, 1988
Positive photosensitive compositions with 1,2-naphthoquinone diazide and novolak resin prepared from α-naphthol and p-cresol
MITSUBISHI CHEM IND22 citations81
US4985470AJan 15, 1991
Photopolymerizable compositions
MITSUBISHI CHEM IND8 citations74
US4650741AMar 17, 1987
Positive photosensitive composition of cocondensed β-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide
MITSUBISHI CHEM IND9 citations73
US4594310AJun 10, 1986
Photopolymerizable composition comprising tertiary aromatic amine and hexaarylbiimazole initiators
MITSUBISHI CHEM IND16 citations73
US5219709AJun 15, 1993
Photopolymerizable composition
MITSUBISHI CHEM IND17 citations71
US4966830AOct 30, 1990
Photopolymerizable composition
MITSUBISHI CHEM IND8 citations71