Inventor
BALLANCE DAVID S
US18 patents
⚠️ This page may combine multiple inventors who share the name “BALLANCE DAVID S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS6090210AJul 18, 2000
Multi-zone gas flow control in a process chamber
APPLIED MATERIALS INC234 citations99
US5781693AJul 14, 1998
Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
APPLIED MATERIALS INC909 citations99
US5960555AOct 5, 1999
Method and apparatus for purging the back side of a substrate during chemical vapor processing
APPLIED MATERIALS INC92 citations97
US5848889ADec 15, 1998
Semiconductor wafer support with graded thermal mass
APPLIED MATERIALS INC74 citations96
US6395363B1May 28, 2002
Sloped substrate support
APPLIED MATERIALS INC88 citations94
US6133152AOct 17, 2000
Co-rotating edge ring extension for use in a semiconductor processing chamber
APPLIED MATERIALS INC43 citations92
US6123766ASep 26, 2000
Method and apparatus for achieving temperature uniformity of a substrate
APPLIED MATERIALS INC37 citations92
US6035100AMar 7, 2000
Reflector cover for a semiconductor processing chamber
APPLIED MATERIALS INC25 citations92
US5920797AJul 6, 1999
Method for gaseous substrate support
APPLIED MATERIALS INC25 citations92
US5884412AMar 23, 1999
Method and apparatus for purging the back side of a substrate during chemical vapor processing
APPLIED MATERIALS INC49 citations92
DOW CORNING
6 patentsUS5145723ASep 8, 1992
Process for coating a substrate with silica
DOW CORNING70 citations95
US5441765AAug 15, 1995
Method of forming Si-O containing coatings
DOW CORNING48 citations94
US5320868AJun 14, 1994
Method of forming SI-O containing coatings
DOW CORNING42 citations92
US5523163AJun 4, 1996
Low dielectric constant coatings
DOW CORNING39 citations90
US5310583AMay 10, 1994
Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
DOW CORNING35 citations89
US5436029AJul 25, 1995
Curing silicon hydride containing materials by exposure to nitrous oxide
DOW CORNING33 citations88