Inventor
BIERMAN BENJAMIN
US13 patents
Patents
13 patentsUS6090210AJul 18, 2000
Multi-zone gas flow control in a process chamber
APPLIED MATERIALS INC234 citations99
US5879128AMar 9, 1999
Lift pin and support pin apparatus for a processing chamber
APPLIED MATERIALS INC607 citations99
US5781693AJul 14, 1998
Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
APPLIED MATERIALS INC909 citations99
US5960555AOct 5, 1999
Method and apparatus for purging the back side of a substrate during chemical vapor processing
APPLIED MATERIALS INC92 citations97
US6157106ADec 5, 2000
Magnetically-levitated rotor system for an RTP chamber
APPLIED MATERIALS INC79 citations96
US5848889ADec 15, 1998
Semiconductor wafer support with graded thermal mass
APPLIED MATERIALS INC74 citations96
US6395363B1May 28, 2002
Sloped substrate support
APPLIED MATERIALS INC88 citations94
US6133152AOct 17, 2000
Co-rotating edge ring extension for use in a semiconductor processing chamber
APPLIED MATERIALS INC43 citations92
US6123766ASep 26, 2000
Method and apparatus for achieving temperature uniformity of a substrate
APPLIED MATERIALS INC37 citations92
US6035100AMar 7, 2000
Reflector cover for a semiconductor processing chamber
APPLIED MATERIALS INC25 citations92
US5920797AJul 6, 1999
Method for gaseous substrate support
APPLIED MATERIALS INC25 citations92
US5884412AMar 23, 1999
Method and apparatus for purging the back side of a substrate during chemical vapor processing
APPLIED MATERIALS INC49 citations92
US6803546B1Oct 12, 2004
Thermally processing a substrate
APPLIED MATERIALS INC25 citations91