Inventor
LIU YOWJUANG BILL
US19 patents
⚠️ This page may combine multiple inventors who share the name “LIU YOWJUANG BILL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ALTERA CORP
12 patentsUS6740944B1May 25, 2004
Dual-oxide transistors for the improvement of reliability and off-state leakage
ALTERA CORP73 citations97
US7471493B1Dec 30, 2008
Fast and compact SCR ESD protection device for high-speed pins
ALTERA CORP29 citations92
US7463057B1Dec 9, 2008
Integrated circuits with adjustable memory element power supplies
ALTERA CORP40 citations92
US6777721B1Aug 17, 2004
SCR device for ESD protection
ALTERA CORP31 citations92
US6974998B1Dec 13, 2005
Field effect transistor with corner diffusions for reduced leakage
ALTERA CORP18 citations91
US7821050B1Oct 26, 2010
CRAM transistors with high immunity to soft error
ALTERA CORP13 citations84
US7186610B1Mar 6, 2007
ESD protection device for high performance IC
ALTERA CORP11 citations84
US7195958B1Mar 27, 2007
Methods of fabricating ESD protection structures
ALTERA CORP7 citations74
US7279753B1Oct 9, 2007
Floating base bipolar ESD devices
ALTERA CORP9 citations73
US6951792B1Oct 4, 2005
Dual-oxide transistors for the improvement of reliability and off-state leakage
ALTERA CORP8 citations73
US6905921B1Jun 14, 2005
Advanced MOSFET design
ALTERA CORP11 citations72
US7514758B2Apr 7, 2009
Dual-oxide transistors for the improvement of reliability and off-state leakage
ALTERA CORP0 citations51
ADVANCED MICRO DEVICES INC
5 patentsUS6201303B1Mar 13, 2001
Method of forming a local interconnect with improved etch selectivity of silicon dioxide/silicide
ADVANCED MICRO DEVICES INC46 citations92
US6225216B1May 1, 2001
Method of forming a local interconnect with improved etch selectivity of silicon dioxide/silicide
ADVANCED MICRO DEVICES INC16 citations84
US6297148B1Oct 2, 2001
Method of forming a silicon bottom anti-reflective coating with reduced junction leakage during salicidation
ADVANCED MICRO DEVICES INC18 citations83
US6258683B1Jul 10, 2001
Local interconnection arrangement with reduced junction leakage and method of forming same
ADVANCED MICRO DEVICES INC11 citations73
US6689697B1Feb 10, 2004
Method of forming uniformly planarized structure in a semiconductor wafer
ADVANCED MICRO DEVICES INC4 citations63