Inventor

HENRI JON

US57 patents

⚠️ This page may combine multiple inventors who share the name “HENRI JON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HENRI JON

NOVELLUS SYSTEMS INC

Methods for depositing films on sensitive substrates

Pulsed PECVD method for modulating hydrogen content in hard mask

Methods for depositing films on sensitive substrates

Methods of depositing highly selective transparent ashable hardmask films

Electroplating process for avoiding defects in metal features of integrated circuit devices

Plasma activated conformal dielectric film deposition

Diffusion barrier and etch stop films

Method of eliminating small bin defects in high throughput TEOS films

Methods for depositing films on sensitive substrates

Method for depositing a chlorine-free conformal sin film

Plasma activated conformal dielectric film deposition

Plasma activated conformal dielectric film deposition

Plasma activated conformal film deposition

Anode and anode chamber for copper electroplating

Method for depositing a chlorine-free conformal SiN film

Methods of depositing stable and hermetic ashable hardmask films

High compressive stress carbon liners for MOS devices

Controlled induction by use of power supply trigger in electrochemical processing

Method for improved thickness repeatability of PECVD deposited carbon films

Method of reducing defects in PECVD TEOS films

Methods for depositing films on sensitive substrates

High compressive stress carbon liners for MOS devices

Methods of depositing smooth and conformal ashable hard mask films

Methods and apparatus for plasma-based deposition

LAM RES CORP

Selective inhibition in atomic layer deposition of silicon-containing films

Selective inhibition in atomic layer deposition of silicon-containing films

Suppressing interfacial reactions by varying the wafer temperature throughout deposition

Method for depositing metals free ald silicon nitride films using halide-based precursors

Method for encapsulating a chalcogenide material

Methods and apparatuses for uniform reduction of the in-feature wet etch rate of a silicon nitride film formed by ALD

Deposition of conformal films by atomic layer deposition and atomic layer etch

Plasma enhanced atomic layer deposition with pulsed plasma exposure

Method of depositing ammonia free and chlorine free conformal silicon nitride film

Method to integrate a halide-containing ALD film on sensitive materials

Selective inhibition in atomic layer deposition of silicon-containing films

Selective growth of metal-containing hardmask thin films

Selective deposition of etch-stop layer for enhanced patterning

Selective growth of metal-containing hardmask thin films

LAVOIE ADRIEN

Plasma activated conformal film deposition

Methods for UV-assisted conformal film deposition

SUBRAMONIUM PRAMOD

Methods of depositing smooth and conformal ashable hard mask films

Pulsed PECVD method for modulating hydrogen content in hard mask

SWAMINATHAN SHANKAR

Plasma activated conformal dielectric film deposition

FANG ZHIYUAN

Plasma clean method for deposition chamber

HAUSMANN DENNIS

Method for depositing a chlorine-free conformal sin film

APPLIED MATERIALS INC

Process for forming a via in an integrated circuit structure by etching through an insulation layer while inhibiting sputtering of underlying metal

YU YONGSIK

Diffusion barrier and etch stop films

HENRI JON

Edge removal of films using externally generated plasma species

BARTLETT CHRISTOPHER M

Temperature controlled showerhead for high temperature operations

NOVELIUS SYSTEMS INC

Method for controlling the grain size of tungsten films