Inventor
SAIDA SHIGEHIKO
JP25 patents
Patents
25 patentsUS6333547B1Dec 25, 2001
Semiconductor device and method of manufacturing the same
TOSHIBA KK110 citations99
US6284583B1Sep 4, 2001
Semiconductor device and method of manufacturing the same
TOSHIBA KK60 citations96
US5869858AFeb 9, 1999
Semiconductor device for reducing variations in characteristics of the device
TOSHIBA KK55 citations96
US7372113B2May 13, 2008
Semiconductor device and method of manufacturing the same
TOSHIBA KK31 citations93
US7081386B2Jul 25, 2006
Semiconductor device and method of manufactuing the same
TOSHIBA KK17 citations93
US6903422B2Jun 7, 2005
Semiconductor integrated circuits, fabrication method for the same and semiconductor integrated circuit systems
TOSHIBA KK38 citations93
US6774462B2Aug 10, 2004
Semiconductor device comprising dual silicon nitride layers with varying nitrogen ratio
TOSHIBA KK39 citations93
US6326658B1Dec 4, 2001
Semiconductor device including an interface layer containing chlorine
TOSHIBA KK52 citations93
US6790723B2Sep 14, 2004
Semiconductor device and method of manufacturing the same
TOSHIBA KK22 citations92
US5949102ASep 7, 1999
Semiconductor device having a gate electrode with only two crystal grains
TOSHIBA KK37 citations92
US5866930AFeb 2, 1999
Semiconductor device and method of manufacturing the same
TOSHIBA KK49 citations92
US6794713B2Sep 21, 2004
Semiconductor device and method of manufacturing the same including a dual layer raised source and drain
TOSHIBA KK14 citations84
US6146938ANov 14, 2000
Method of fabricating semiconductor device
TOSHIBA KK18 citations84
US7129132B2Oct 31, 2006
Semiconductor device and method of manufacturing the same
TOSHIBA KK3 citations74
US7098115B2Aug 29, 2006
Semiconductor device and method of manufacturing the same
TOSHIBA KK7 citations74
US7060555B2Jun 13, 2006
Semiconductor device and method of manufacturing the same
TOSHIBA KK5 citations74
US6713359B1Mar 30, 2004
Semiconductor device and method of manufacturing the same including raised source/drain comprising SiGe or SiC
TOSHIBA KK12 citations74
US6772045B2Aug 3, 2004
System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device
TOSHIBA KK8 citations73
US7148158B2Dec 12, 2006
Semiconductor device and method for manufacturing the same
TOSHIBA KK4 citations63
US6538271B2Mar 25, 2003
Semiconductor device and method of manufacturing the same
TOSHIBA KK3 citations63
USRE46122EAug 23, 2016
Semiconductor device and method of manufacturing the same
TOSHIBA KK0 citations52
US7612401B2Nov 3, 2009
Non-volatile memory cell
TOSHIBA KK0 citations52
US7541233B2Jun 2, 2009
Semiconductor device and method of manufacturing the same
TOSHIBA KK0 citations52
US6992020B2Jan 31, 2006
Method of fabricating semiconductor device
TOSHIBA KK0 citations52
US6841850B2Jan 11, 2005
Semiconductor device having silicon nitride film and silicon oxide film, and method of fabricating the same
TOSHIBA KK1 citations52