P

Inventor

DESHPANDE SADANAND V

US17 patents

Patents

17 patents
US7595010B2Sep 29, 2009

Method for producing a doped nitride film, doped oxide film and other doped films

IBM57 citations97
US7361611B2Apr 22, 2008

Doped nitride film, doped oxide film and other doped films

IBM55 citations97
US6790733B1Sep 14, 2004

Preserving TEOS hard mask using COR for raised source-drain including removable/disposable spacer

IBM122 citations97
US6930030B2Aug 16, 2005

Method of forming an electronic device on a recess in the surface of a thin film of silicon etched to a precise thickness

IBM57 citations95
US6960510B2Nov 1, 2005

Method of making sub-lithographic features

IBM21 citations92
US6887798B2May 3, 2005

STI stress modification by nitrogen plasma treatment for improving performance in small width devices

IBM16 citations92
US6512266B1Jan 28, 2003

Method of fabricating SiO2 spacers and annealing caps

IBM40 citations92
US6884734B2Apr 26, 2005

Vapor phase etch trim structure with top etch blocking layer

IBM38 citations91
US7479688B2Jan 20, 2009

STI stress modification by nitrogen plasma treatment for improving performance in small width devices

IBM11 citations84
US7407875B2Aug 5, 2008

Low resistance contact structure and fabrication thereof

IBM16 citations84
US7700425B2Apr 20, 2010

Raised source drain mosfet with amorphous notched gate cap layer with notch sidewalls passivated and filled with dielectric plug

IBM8 citations83
US6903023B2Jun 7, 2005

In-situ plasma etch for TERA hard mask materials

IBM15 citations80
US7344983B2Mar 18, 2008

Clustered surface preparation for silicide and metal contacts

IBM4 citations62
US7091081B2Aug 15, 2006

Method for patterning a semiconductor region

IBM3 citations56
US7354867B2Apr 8, 2008

Etch process for improving yield of dielectric contacts on nickel silicides

IBM1 citations50
US9451684B2Sep 20, 2016

Dual pulse driven extreme ultraviolet (EUV) radiation source method

IBM0 citations48
US9301381B1Mar 29, 2016

Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas

IBM0 citations48