Inventor
SUBRAMANI ANANTHA
US35 patents
⚠️ This page may combine multiple inventors who share the name “SUBRAMANI ANANTHA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
29 patentsUS6406599B1Jun 18, 2002
Magnetron with a rotating center magnet for a vault shaped sputtering target
APPLIED MATERIALS INC45 citations96
US6219219B1Apr 17, 2001
Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing system
APPLIED MATERIALS INC63 citations93
US6162297ADec 19, 2000
Embossed semiconductor fabrication parts
APPLIED MATERIALS INC59 citations93
US6254746B1Jul 3, 2001
Recessed coil for generating a plasma
APPLIED MATERIALS INC47 citations92
US6723214B2Apr 20, 2004
Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system
APPLIED MATERIALS INC22 citations90
US6589407B1Jul 8, 2003
Aluminum deposition shield
APPLIED MATERIALS INC37 citations88
US10236412B2Mar 19, 2019
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
APPLIED MATERIALS INC3 citations84
US9376752B2Jun 28, 2016
Edge ring for a deposition chamber
APPLIED MATERIALS INC15 citations84
US8765601B2Jul 1, 2014
Post deposition treatments for CVD cobalt films
APPLIED MATERIALS INC6 citations84
US7163607B2Jan 16, 2007
Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system
APPLIED MATERIALS INC10 citations82
US6409890B1Jun 25, 2002
Method and apparatus for forming a uniform layer on a workpiece during sputtering
APPLIED MATERIALS INC10 citations74
US11081623B2Aug 3, 2021
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
APPLIED MATERIALS INC2 citations73
US10546973B2Jan 28, 2020
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
APPLIED MATERIALS INC1 citations73
US10109481B2Oct 23, 2018
Aluminum-nitride buffer and active layers by physical vapor deposition
APPLIED MATERIALS INC3 citations73
US11575071B2Feb 7, 2023
Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices
APPLIED MATERIALS INC0 citations62
US10903067B2Jan 26, 2021
Cooled reflective adapter plate for a deposition chamber
APPLIED MATERIALS INC0 citations62
US6790326B2Sep 14, 2004
Magnetron for a vault shaped sputtering target having two opposed sidewall magnets
APPLIED MATERIALS INC2 citations62
US11011676B2May 18, 2021
PVD buffer layers for LED fabrication
APPLIED MATERIALS INC0 citations61
US9929310B2Mar 27, 2018
Oxygen controlled PVD aluminum nitride buffer for gallium nitride-based optoelectronic and electronic devices
APPLIED MATERIALS INC1 citations61
US9863038B2Jan 9, 2018
Off-angled heating of the underside of a substrate using a lamp assembly
APPLIED MATERIALS INC1 citations61
US10957565B2Mar 23, 2021
Processing tool having a monitoring device
APPLIED MATERIALS INC0 citations60
US12282256B2Apr 22, 2025
Photoresist deposition using independent multichannel showerhead
APPLIED MATERIALS INC0 citations59
US7718045B2May 18, 2010
Ground shield with reentrant feature
APPLIED MATERIALS INC4 citations58
US12012652B2Jun 18, 2024
Single process volume to perform high-pressure and low-pressure processes with features to reduce cross-contamination
APPLIED MATERIALS INC0 citations52
US10193014B2Jan 29, 2019
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
APPLIED MATERIALS INC0 citations52
US9666416B2May 30, 2017
Apparatus and method for depositing electronically conductive pasting material
APPLIED MATERIALS INC0 citations52
US11551905B2Jan 10, 2023
Resonant process monitor
APPLIED MATERIALS INC0 citations50
US10763143B2Sep 1, 2020
Processing tool having a monitoring device
APPLIED MATERIALS INC0 citations50
US12505988B2Dec 23, 2025
Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedestal for multiphase cyclic deposition
APPLIED MATERIALS INC0 citations45