Inventor
SHIH JEN-CHIEH
TW26 patents
⚠️ This page may combine multiple inventors who share the name “SHIH JEN-CHIEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
18 patentsUS6900134B1May 31, 2005
Method for forming openings in a substrate using bottom antireflective coatings
TAIWAN SEMICONDUCTOR MFG28 citations92
US7180572B2Feb 20, 2007
Immersion optical projection system
TAIWAN SEMICONDUCTOR MFG11 citations84
US7501226B2Mar 10, 2009
Immersion lithography system with wafer sealing mechanisms
TAIWAN SEMICONDUCTOR MFG11 citations80
US7642184B2Jan 5, 2010
Method for dual damascene process
TAIWAN SEMICONDUCTOR MFG7 citations74
US7119035B2Oct 10, 2006
Method using specific contact angle for immersion lithography
TAIWAN SEMICONDUCTOR MFG5 citations72
US7517639B2Apr 14, 2009
Seal ring arrangements for immersion lithography systems
TAIWAN SEMICONDUCTOR MFG4 citations63
US7972957B2Jul 5, 2011
Method of making openings in a layer of a semiconductor device
TAIWAN SEMICONDUCTOR MFG2 citations62
US7452822B2Nov 18, 2008
Via plug formation in dual damascene process
TAIWAN SEMICONDUCTOR MFG6 citations62
US7135259B2Nov 14, 2006
Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
TAIWAN SEMICONDUCTOR MFG4 citations62
US8039195B2Oct 18, 2011
Si device making method by using a novel material for packing and unpacking process
TAIWAN SEMICONDUCTOR MFG4 citations61
US7948096B2May 24, 2011
Semiconductor using specific contact angle for immersion lithography
TAIWAN SEMICONDUCTOR MFG2 citations61
US7924401B2Apr 12, 2011
Seal ring arrangements for immersion lithography systems
TAIWAN SEMICONDUCTOR MFG0 citations52
US7751025B2Jul 6, 2010
Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
TAIWAN SEMICONDUCTOR MFG0 citations52
US7667821B2Feb 23, 2010
Multi-focus scanning with a tilted mask or wafer
TAIWAN SEMICONDUCTOR MFG0 citations52
US8029969B2Oct 4, 2011
Material and method for photolithography
TAIWAN SEMICONDUCTOR MFG0 citations51
US7279793B2Oct 9, 2007
System and method for manufacturing semiconductor devices using an anti-reflective coating layer
TAIWAN SEMICONDUCTOR MFG0 citations51
US7238624B2Jul 3, 2007
System and method for manufacturing semiconductor devices using a vacuum chamber
TAIWAN SEMICONDUCTOR MFG1 citations51
US7777184B2Aug 17, 2010
Method for photoresist characterization and analysis
TAIWAN SEMICONDUCTOR MFG0 citations50