Inventor
SPOONER TERRY A
US81 patents
⚠️ This page may combine multiple inventors who share the name “SPOONER TERRY A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
35 patentsUS7528066B2May 5, 2009
Structure and method for metal integration
IBM50 citations96
US9786603B1Oct 10, 2017
Surface nitridation in metal interconnects
IBM14 citations93
US9373582B1Jun 21, 2016
Self aligned via in integrated circuit
IBM18 citations92
US7119018B2Oct 10, 2006
Copper conductor
IBM20 citations92
US9837309B2Dec 5, 2017
Semiconductor via structure with lower electrical resistance
IBM6 citations84
US9786550B2Oct 10, 2017
Low resistance metal contacts to interconnects
IBM8 citations84
US9548243B1Jan 17, 2017
Self aligned via and pillar cut for at least a self aligned double pitch
IBM7 citations84
US7816253B2Oct 19, 2010
Surface treatment of inter-layer dielectric
IBM10 citations84
US7781332B2Aug 24, 2010
Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer
IBM11 citations84
US7750479B2Jul 6, 2010
Treatment of plasma damaged layer for critical dimension retention, pore sealing and repair
IBM11 citations84
US7749892B2Jul 6, 2010
Embedded nano UV blocking and diffusion barrier for improved reliability of copper/ultra low K interlevel dielectric electronic devices
IBM16 citations84
US7446058B2Nov 4, 2008
Adhesion enhancement for metal/dielectric interface
IBM10 citations84
US10157789B2Dec 18, 2018
Via formation using sidewall image transfer process to define lateral dimension
IBM12 citations83
US9490168B1Nov 8, 2016
Via formation using sidewall image transfer process to define lateral dimension
IBM10 citations83
US9385078B1Jul 5, 2016
Self aligned via in integrated circuit
IBM11 citations83
US9899317B1Feb 20, 2018
Nitridization for semiconductor structures
IBM8 citations82
US7709344B2May 4, 2010
Integrated circuit fabrication process using gas cluster ion beam etching
IBM16 citations82
US7795740B2Sep 14, 2010
Adhesion enhancement for metal/dielectric interface
IBM6 citations74
US7402883B2Jul 22, 2008
Back end of the line structures with liner and noble metal layer
IBM6 citations74
US11062993B2Jul 13, 2021
Contacts having a geometry to reduce resistance
IBM2 citations73
US10468491B1Nov 5, 2019
Low resistance contact for transistors
IBM3 citations73
US10460990B2Oct 29, 2019
Semiconductor via structure with lower electrical resistance
IBM2 citations73
US10128147B2Nov 13, 2018
Interconnect structure
IBM2 citations73
US9799552B2Oct 24, 2017
Low resistance metal contacts to interconnects
IBM2 citations73
US7215006B2May 8, 2007
Plating seed layer including an oxygen/nitrogen transition region for barrier enhancement
IBM5 citations73
US8017522B2Sep 13, 2011
Mechanically robust metal/low-κ interconnects
IBM5 citations71
US12389803B2Aug 12, 2025
Magnetoresistive random-access memory (MRAM) with preserved underlying dielectric layer
IBM0 citations63
US11875987B2Jan 16, 2024
Contacts having a geometry to reduce resistance
IBM0 citations63
US11735468B2Aug 22, 2023
Interconnect structures including self aligned vias
IBM0 citations63
US11227792B2Jan 18, 2022
Interconnect structures including self aligned vias
IBM0 citations63
US11145543B2Oct 12, 2021
Semiconductor via structure with lower electrical resistance
IBM0 citations63
US10957582B2Mar 23, 2021
Self aligned via and pillar cut for at least a self aligned double pitch
IBM0 citations63
US10957581B2Mar 23, 2021
Self aligned via and pillar cut for at least a self aligned double pitch
IBM0 citations63
US10923575B2Feb 16, 2021
Low resistance contact for transistors
IBM0 citations63
US10886168B2Jan 5, 2021
Surface modified dielectric refill structure
IBM0 citations63
GLOBALFOUNDRIES INC
4 patentsUS10192780B1Jan 29, 2019
Self-aligned multiple patterning processes using bi-layer mandrels and cuts formed with block masks
GLOBALFOUNDRIES INC15 citations85
US10818494B2Oct 27, 2020
Metal on metal multiple patterning
GLOBALFOUNDRIES INC2 citations71
US10784119B2Sep 22, 2020
Multiple patterning with lithographically-defined cuts
GLOBALFOUNDRIES INC2 citations68
US10566231B2Feb 18, 2020
Interconnect formation with chamferless via, and related interconnect
GLOBALFOUNDRIES INC2 citations66
ARNOLD JOHN C
3 patentsUS8481423B2Jul 9, 2013
Methods to mitigate plasma damage in organosilicate dielectrics
ARNOLD JOHN C8 citations84
US8470706B2Jun 25, 2013
Methods to mitigate plasma damage in organosilicate dielectrics
ARNOLD JOHN C8 citations84
US8129843B2Mar 6, 2012
Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer
ARNOLD JOHN C5 citations74
EDELSTEIN DANIEL C
2 patentsCHEN SHYNG-TSONG
2 patentsUS8519540B2Aug 27, 2013
Self-aligned dual damascene BEOL structures with patternable low- K material and methods of forming same
CHEN SHYNG-TSONG10 citations82
US8415248B2Apr 9, 2013
Self-aligned dual damascene BEOL structures with patternable low-k material and methods of forming same
CHEN SHYNG-TSONG6 citations82
YANG CHIH-CHAO
1 patentINFINEON TECHNOLOGIES AG
1 patentINT BUSINESS MACHINES INT
1 patentOU YA
1 patentShowing the top 50 of 81 patents by PatentIndex Score.