Inventor
LUBASHEVSKY YUVAL
IL14 patents
⚠️ This page may combine multiple inventors who share the name “LUBASHEVSKY YUVAL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA CORP
8 patentsUS11796925B2Oct 24, 2023
Scanning overlay metrology using overlay targets having multiple spatial frequencies
KLA CORP6 citations72
US11409205B2Aug 9, 2022
Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices
KLA CORP2 citations72
US12105431B2Oct 1, 2024
Annular apodizer for small target overlay measurement
KLA CORP0 citations52
US12422363B2Sep 23, 2025
Scanning scatterometry overlay metrology
KLA CORP0 citations50
US12373936B2Jul 29, 2025
System and method for overlay metrology using a phase mask
KLA CORP0 citations50
US12105414B2Oct 1, 2024
Targets for diffraction-based overlay error metrology
KLA CORP0 citations50
US12487190B2Dec 2, 2025
System and method for isolation of specific fourier pupil frequency in overlay metrology
KLA CORP0 citations47
US12504697B2Dec 23, 2025
Single grab pupil landscape via broadband illumination
KLA CORP0 citations44
KLA TENCOR CORP
6 patentsUS10197389B2Feb 5, 2019
Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
KLA TENCOR CORP19 citations94
US10824079B2Nov 3, 2020
Diffraction based overlay scatterometry
KLA TENCOR CORP12 citations85
US10401228B2Sep 3, 2019
Simultaneous capturing of overlay signals from multiple targets
KLA TENCOR CORP6 citations84
US10048132B2Aug 14, 2018
Simultaneous capturing of overlay signals from multiple targets
KLA TENCOR CORP10 citations84
US10579768B2Mar 3, 2020
Process compatibility improvement by fill factor modulation
KLA TENCOR CORP3 citations72
US11112704B2Sep 7, 2021
Mitigation of inaccuracies related to grating asymmetries in scatterometry measurements
KLA TENCOR CORP2 citations71