Inventor
PASKOVER YURI
IL30 patents
⚠️ This page may combine multiple inventors who share the name “PASKOVER YURI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
20 patentsUS10197389B2Feb 5, 2019
Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
KLA TENCOR CORP19 citations94
US10824079B2Nov 3, 2020
Diffraction based overlay scatterometry
KLA TENCOR CORP12 citations85
US10401228B2Sep 3, 2019
Simultaneous capturing of overlay signals from multiple targets
KLA TENCOR CORP6 citations84
US10048132B2Aug 14, 2018
Simultaneous capturing of overlay signals from multiple targets
KLA TENCOR CORP10 citations84
US9864209B2Jan 9, 2018
Self-moire target design principles for measuring unresolved device-like pitches
KLA TENCOR CORP13 citations84
US10190979B2Jan 29, 2019
Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
KLA TENCOR CORP12 citations83
US11119417B2Sep 14, 2021
Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)
KLA TENCOR CORP5 citations73
US10444161B2Oct 15, 2019
Systems and methods for metrology with layer-specific illumination spectra
KLA TENCOR CORP2 citations73
US10101592B2Oct 16, 2018
Self-moiré target design principles for measuring unresolved device-like pitches
KLA TENCOR CORP3 citations73
US10579768B2Mar 3, 2020
Process compatibility improvement by fill factor modulation
KLA TENCOR CORP3 citations72
US11314173B2Apr 26, 2022
Topographic phase control for overlay measurement
KLA TENCOR CORP2 citations71
US10677588B2Jun 9, 2020
Localized telecentricity and focus optimization for overlay metrology
KLA TENCOR CORP5 citations71
US10520832B2Dec 31, 2019
Topographic phase control for overlay measurement
KLA TENCOR CORP4 citations71
US11281111B2Mar 22, 2022
Off-axis illumination overlay measurement using two-diffracted orders imaging
KLA TENCOR CORP2 citations70
US11852590B1Dec 26, 2023
Systems and methods for metrology with layer-specific illumination spectra
KLA TENCOR CORP1 citations62
US11815347B2Nov 14, 2023
Optical near-field metrology
KLA TENCOR CORP0 citations62
US10139528B1Nov 27, 2018
Compound objectives for imaging and scatterometry overlay
KLA TENCOR CORP0 citations52
US10866090B2Dec 15, 2020
Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology
KLA TENCOR CORP0 citations51
US10408602B2Sep 10, 2019
Quality estimation and improvement of imaging metrology targets
KLA TENCOR CORP0 citations49
US10565697B2Feb 18, 2020
Utilizing overlay misregistration error estimations in imaging overlay metrology
KLA TENCOR CORP0 citations37
KLA CORP
9 patentsUS11378394B1Jul 5, 2022
On-the-fly scatterometry overlay metrology target
KLA CORP7 citations80
US11841621B2Dec 12, 2023
Moiré scatterometry overlay
KLA CORP2 citations73
US11409205B2Aug 9, 2022
Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices
KLA CORP2 citations72
US12001148B2Jun 4, 2024
Enhancing performance of overlay metrology
KLA CORP2 citations70
US11101153B2Aug 24, 2021
Parameter-stable misregistration measurement amelioration in semiconductor devices
KLA CORP1 citations61
US11592755B2Feb 28, 2023
Enhancing performance of overlay metrology
KLA CORP1 citations59
US12422363B2Sep 23, 2025
Scanning scatterometry overlay metrology
KLA CORP0 citations50
US12222199B2Feb 11, 2025
Systems and methods for measurement of misregistration and amelioration thereof
KLA CORP0 citations50
US12487190B2Dec 2, 2025
System and method for isolation of specific fourier pupil frequency in overlay metrology
KLA CORP0 citations47