Inventor
OU Keiyu
JP8 patents
Patents
8 patentsUS10859914B2Dec 8, 2020
Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development
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US10025186B2Jul 17, 2018
Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP2 citations71
US9791777B2Oct 17, 2017
Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations51
US12216404B2Feb 4, 2025
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations50
US10649329B2May 12, 2020
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations50
US12235579B2Feb 25, 2025
Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations49
US11073762B2Jul 27, 2021
Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator
FUJIFILM CORP0 citations48
US9952509B2Apr 24, 2018
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations40