Inventor
TANGO NAOHIRO
JP15 patents
⚠️ This page may combine multiple inventors who share the name “TANGO NAOHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
12 patentsUS11281103B2Mar 22, 2022
Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device
FUJIFILM CORP2 citations72
US10175578B2Jan 8, 2019
Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device
FUJIFILM CORP1 citations62
US11579528B2Feb 14, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations57
US10578968B2Mar 3, 2020
Pattern forming method, resist pattern, and process for producing electronic device
FUJIFILM CORP0 citations52
US10114292B2Oct 30, 2018
Pattern forming method, resist pattern, and method for manufacturing electronic device
FUJIFILM CORP0 citations52
US11249395B2Feb 15, 2022
Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film
FUJIFILM CORP0 citations51
US11584810B2Feb 21, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin
FUJIFILM CORP0 citations50
US12235579B2Feb 25, 2025
Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations49
US12242192B2Mar 4, 2025
Photosensitive resin composition, method for producing the same, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations47
US10852637B2Dec 1, 2020
Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film
FUJIFILM CORP0 citations41
US9454079B2Sep 27, 2016
Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
FUJIFILM CORP0 citations40
US9810981B2Nov 7, 2017
Pattern formation method, etching method, electronic device manufacturing method, and electronic device
FUJIFILM CORP0 citations39