Inventor

ASANO TAKATERU

JP8 patents

⚠️ This page may combine multiple inventors who share the name “ASANO TAKATERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OKI ELECTRIC IND CO LTD

4 patents

US4801518AJan 31, 1989

Method of forming a photoresist pattern

OKI ELECTRIC IND CO LTD15 citations72

US5128231AJul 7, 1992

Negative photoresist composition comprising a photosensitizer of a polyhalogen compound

OKI ELECTRIC IND CO LTD10 citations70

US4889795ADec 26, 1989

Process for forming photoresist pattern using contrast enhancement layer with abietic acid

OKI ELECTRIC IND CO LTD18 citations70

US4845143AJul 4, 1989

Pattern-forming material

OKI ELECTRIC IND CO LTD3 citations61

FUJI CHEM IND CO LTD

2 patents

US5948592ASep 7, 1999

Water-soluble photoresist composition

FUJI CHEM IND CO LTD10 citations71

US4588669AMay 13, 1986

Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer

FUJI CHEM IND CO LTD18 citations71

FUJI CHEMICALS IND COMPANY LIM

1 patent

US4097283AJun 27, 1978

Water-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizer

FUJI CHEMICALS IND COMPANY LIM8 citations67

AGENCY IND SCIENCE TECHN

1 patent

US4560640ADec 24, 1985

Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof

AGENCY IND SCIENCE TECHN3 citations53