Inventor

IWAMATSU SEIICHI

JP20 patents

⚠️ This page may combine multiple inventors who share the name “IWAMATSU SEIICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IWAMATSU SEIICHI

SEIKO EPSON CORP

Thin-film SOI semiconductor device having heavily doped diffusion regions beneath the channels of transistors

Trench gate metal oxide semiconductor field effect transistor

Semiconductor device with enhanced via or contact hole connection between an interconnect layer and a connecting region

Josephson device

Thin film metal interconnects in integrated circuit structures to reduce circuit operation speed delay

Field effect type josephson transistor

Ion beam gun and ion beam exposure device

Method of forming optimized thin film metal interconnects in integrated circuit structures of apparatus to reduce circuit operational delay

Optimized thin film metal interconnects in integrated circuit structures of apparatus to reduce circuit operational delay

SUWA SEIKOSHA KK

X-ray source

Semiconductor substrate

High pressure chemical vapor deposition

X-Ray lithography mask

SI DIAMOND TECHN INC

Electron beam duplication lithography method and apparatus

Electron beam duplication lithography method

Electron beam duplication lithography method and apparatus

HITACHI LTD

MIS semiconductor device and method of manufacturing the same

Method of manufacturing a semiconductor storage device

VLSI TECHNOLOGY RES ASS

Method of fabricating an integrated circuit device utilizing electron beam irradiation and selective oxidation

Light-reflection type pattern forming system