Inventor
ROESCHERT HORST
DE35 patents
⚠️ This page may combine multiple inventors who share the name “ROESCHERT HORST”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST AG
23 patentsUS5314786AMay 24, 1994
Positive-working radiation sensitive mixture comprising sulfonic acid esters of 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine, and recording material containing these esters
HOECHST AG20 citations93
US5227276AJul 13, 1993
Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture
HOECHST AG21 citations93
US5340682AAug 23, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
HOECHST AG29 citations92
US5338641AAug 16, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
HOECHST AG39 citations92
US5326840AJul 5, 1994
Radiation-sensitive mixture containing novel polymers embodying units composed of amides of α, β-unsaturated carboxylic acids as binders
HOECHST AG48 citations92
US5424166AJun 13, 1995
Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
HOECHST AG21 citations91
US5716756AFeb 10, 1998
Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use
HOECHST AG29 citations90
US5498506AMar 12, 1996
Positive-acting radiation-sensitive mixture and recording material produced therewith
HOECHST AG32 citations90
US5502261AMar 26, 1996
Process for preparing 2,2'-bis(halomethyl)-1,1'-binaphthyl
HOECHST AG8 citations74
US5326826AJul 5, 1994
Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation
HOECHST AG16 citations74
US5286602AFeb 15, 1994
Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
HOECHST AG8 citations74
US5364734ANov 15, 1994
Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith
HOECHST AG19 citations73
US5328973AJul 12, 1994
Radiation-sensitive mixture with a polymeric binder containing units of α,β-unsaturated carboxamides
HOECHST AG14 citations73
US5298364AMar 29, 1994
Radiation-sensitive sulfonic acid esters and their use
HOECHST AG6 citations73
US5401608AMar 28, 1995
Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith
HOECHST AG17 citations72
US5346806ASep 13, 1994
Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
HOECHST AG7 citations72
US5767317AJun 16, 1998
Process for preparing 2,2'-bis(diphenylphosphinylmethyl)-1,1'-binaphthyls and new compounds from this class of substances
HOECHST AG2 citations63
US5302488AApr 12, 1994
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material
HOECHST AG6 citations63
US5256517AOct 26, 1993
Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units
HOECHST AG6 citations63
US5191069AMar 2, 1993
Polyfunctional compounds containing α-diazo-β-keto ester units and sulfonate units
HOECHST AG5 citations63
US5346804ASep 13, 1994
Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture
HOECHST AG6 citations58
US5442061AAug 15, 1995
Radiation-sensitive sulfonic acid esters and their use
HOECHST AG1 citations52
US5247096ASep 21, 1993
Process for preparing n-tert-butoxycarbonylmaleimide
HOECHST AG1 citations52
TICONA GMBH
3 patentsUS7902324B2Mar 8, 2011
Initiator
TICONA GMBH6 citations74
USRE39182EJul 11, 2006
Process for the preparation of thermally stable polyoxymethylene copolymers
TICONA GMBH2 citations60
US6169164B1Jan 2, 2001
Process for preparing polyoxymethylene molding compositions of improved quality
TICONA GMBH0 citations44