P

Inventor

SPIESS WALTER

DE18 patents
⚠️ This page may combine multiple inventors who share the name “SPIESS WALTER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOECHST AG

15 patents
US5230985AJul 27, 1993

Negative-working radiation-sensitive mixtures, and radiation-sensitive recording material produced with these mixtures

HOECHST AG22 citations92
US5424166AJun 13, 1995

Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom

HOECHST AG21 citations91
US5716756AFeb 10, 1998

Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use

HOECHST AG29 citations90
US5498506AMar 12, 1996

Positive-acting radiation-sensitive mixture and recording material produced therewith

HOECHST AG32 citations90
US5286602AFeb 15, 1994

Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

HOECHST AG8 citations74
US5364734ANov 15, 1994

Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

HOECHST AG19 citations73
US5356752AOct 18, 1994

Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures

HOECHST AG17 citations73
US5298364AMar 29, 1994

Radiation-sensitive sulfonic acid esters and their use

HOECHST AG6 citations73
US5286867AFeb 15, 1994

Substituted 1-sulfonyloxy-2-pyridones and process for preparing them

HOECHST AG16 citations73
US5229254AJul 20, 1993

Positive-working radiation-sensitive mixtures, and radiation-sensitive recording materials produced with these mixtures

HOECHST AG17 citations73
US5401608AMar 28, 1995

Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

HOECHST AG17 citations72
US5346806ASep 13, 1994

Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

HOECHST AG7 citations72
US5256517AOct 26, 1993

Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units

HOECHST AG6 citations63
US5346804ASep 13, 1994

Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture

HOECHST AG6 citations58
US5442061AAug 15, 1995

Radiation-sensitive sulfonic acid esters and their use

HOECHST AG1 citations52

AZ ELECTRONIC MATERIALS D GMBH

1 patent

HOECHST CELANESE CORP

1 patent

CLARIANT GMBH

1 patent