P

Inventor

ANDRICACOS PANAYOTIS C

US20 patents

Patents

20 patents
US7008871B2Mar 7, 2006

Selective capping of copper wiring

IBM105 citations98
US6344129B1Feb 5, 2002

Method for plating copper conductors and devices formed

IBM46 citations96
US5522975AJun 4, 1996

Electroplating workpiece fixture

IBM144 citations96
US5516412AMay 14, 1996

Vertical paddle plating cell

IBM394 citations96
US5352350AOct 4, 1994

Method for controlling chemical species concentration

IBM75 citations96
US5132859AJul 21, 1992

Thin film structures for magnetic recording heads

IBM58 citations96
US6471845B1Oct 29, 2002

Method of controlling chemical bath composition in a manufacturing environment

IBM63 citations95
US7190079B2Mar 13, 2007

Selective capping of copper wiring

IBM39 citations92
US6911229B2Jun 28, 2005

Structure comprising an interlayer of palladium and/or platinum and method for fabrication thereof

IBM20 citations92
US6251251B1Jun 26, 2001

Anode design for semiconductor deposition

IBM35 citations92
US5582927ADec 10, 1996

High magnetic moment materials and process for fabrication of thin film heads

IBM33 citations91
US5385661AJan 31, 1995

Acid electrolyte solution and process for the electrodeposition of copper-rich alloys exploiting the phenomenon of underpotential deposition

IBM43 citations90
US7638406B2Dec 29, 2009

Method of fabricating a high Q factor integrated circuit inductor

IBM13 citations84
US7068138B2Jun 27, 2006

High Q factor integrated circuit inductor

IBM12 citations84
US6331237B1Dec 18, 2001

Method of improving contact reliability for electroplating

IBM12 citations70
US7829427B2Nov 9, 2010

Method of fabricating a high Q factor integrated circuit inductor

IBM4 citations63
US6992389B2Jan 31, 2006

Barrier for interconnect and method

IBM4 citations61
US6979393B2Dec 27, 2005

Method for plating copper conductors and devices formed

IBM0 citations52
US6776885B2Aug 17, 2004

Integrated plating and planarization apparatus having a variable-diameter counterelectrode

IBM0 citations52
US7227265B2Jun 5, 2007

Electroplated copper interconnection structure, process for making and electroplating bath

IBM1 citations51