Inventor
PAN PAI
US4 patents
Patents
4 patentsUS6455394B1Sep 24, 2002
Method for trench isolation by selective deposition of low temperature oxide films
MICRON TECHNOLOGY INC55 citations95
US6660180B2Dec 9, 2003
Compositions for etching silicon with high selectivity to oxides and methods of using same
MICRON TECHNOLOGY INC18 citations91
US6391793B2May 21, 2002
Compositions for etching silicon with high selectivity to oxides and methods of using same
MICRON TECHNOLOGY INC40 citations91
US6888212B2May 3, 2005
Method for trench isolation by selective deposition of low temperature oxide films
MICRON TECHNOLOGY INC5 citations73