Inventor
RYZA NICHOLAS ALAN
US3 patents
Patents
3 patentsUS6928746B2Aug 16, 2005
Drying resist with a solvent bath and supercritical CO2
TOKYO ELECTRON LTD18 citations79
US6924086B1Aug 2, 2005
Developing photoresist with supercritical fluid and developer
TOKYO ELECTRON LTD7 citations69
US7044662B2May 16, 2006
Developing photoresist with supercritical fluid and developer
TOKYO ELECTRON LTD1 citations47