Inventor
SHAO WENJIN
US17 patents
⚠️ This page may combine multiple inventors who share the name “SHAO WENJIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
8 patentsUS8379991B2Feb 19, 2013
Delta TCC for fast sensitivity model computation
ASML NETHERLANDS BV5 citations84
US8874423B2Oct 28, 2014
Model-based scanner tuning systems and methods
ASML NETHERLANDS BV9 citations83
US10846442B2Nov 24, 2020
Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
ASML NETHERLANDS BV1 citations73
US10025885B2Jul 17, 2018
Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
ASML NETHERLANDS BV2 citations73
US10137643B2Nov 27, 2018
Model-based process simulation systems and methods
ASML NETHERLANDS BV1 citations62
US8942463B2Jan 27, 2015
Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
ASML NETHERLANDS BV0 citations52
US10569469B2Feb 25, 2020
Model-based scanner tuning systems and methods
ASML NETHERLANDS BV0 citations51
US9672301B2Jun 6, 2017
Pattern selection for lithographic model calibration
ASML NETHERLANDS BV0 citations51
CAO YU
6 patentsUS8571845B2Oct 29, 2013
Model-based scanner tuning systems and methods
CAO YU15 citations91
US8694928B2Apr 8, 2014
Pattern selection for lithographic model calibration
CAO YU12 citations89
US8806387B2Aug 12, 2014
Model-based process simulation systems and methods
CAO YU7 citations83
US10025198B2Jul 17, 2018
Smart selection and/or weighting of parameters for lithographic process simulation
CAO YU5 citations69
US8682059B2Mar 25, 2014
Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
CAO YU2 citations62
US8447095B2May 21, 2013
Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
CAO YU2 citations62