Inventor
PINSON II JAY D
US33 patents
⚠️ This page may combine multiple inventors who share the name “PINSON II JAY D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
31 patentsUS6518195B1Feb 11, 2003
Plasma reactor using inductive RF coupling, and processes
APPLIED MATERIALS INC162 citations98
US6068784AMay 30, 2000
Process used in an RF coupled plasma reactor
APPLIED MATERIALS INC173 citations98
US5556501ASep 17, 1996
Silicon scavenger in an inductively coupled RF plasma reactor
APPLIED MATERIALS INC396 citations98
US5187454AFeb 16, 1993
Electronically tuned matching network using predictor-corrector control system
APPLIED MATERIALS INC165 citations98
US9466469B2Oct 11, 2016
Remote plasma source for controlling plasma skew
APPLIED MATERIALS INC121 citations97
US6545420B1Apr 8, 2003
Plasma reactor using inductive RF coupling, and processes
APPLIED MATERIALS INC135 citations97
US6488807B1Dec 3, 2002
Magnetic confinement in a plasma reactor having an RF bias electrode
APPLIED MATERIALS INC145 citations97
US6251792B1Jun 26, 2001
Plasma etch processes
APPLIED MATERIALS INC122 citations97
US5574410ANov 12, 1996
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
APPLIED MATERIALS INC66 citations95
US5392018AFeb 21, 1995
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
APPLIED MATERIALS INC70 citations95
US6413145B1Jul 2, 2002
System for polishing and cleaning substrates
APPLIED MATERIALS INC38 citations92
US5572170ANov 5, 1996
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
APPLIED MATERIALS INC31 citations92
US6887124B2May 3, 2005
Method of polishing and cleaning substrates
APPLIED MATERIALS INC14 citations84
US10428426B2Oct 1, 2019
Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime
APPLIED MATERIALS INC9 citations83
US10403535B2Sep 3, 2019
Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system
APPLIED MATERIALS INC11 citations83
US10083818B2Sep 25, 2018
Auto frequency tuned remote plasma source
APPLIED MATERIALS INC8 citations83
US10388549B2Aug 20, 2019
On-board metrology (OBM) design and implication in process tool
APPLIED MATERIALS INC8 citations79
US10192717B2Jan 29, 2019
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
APPLIED MATERIALS INC3 citations73
US9305749B2Apr 5, 2016
Methods of directing magnetic fields in a plasma source, and associated systems
APPLIED MATERIALS INC3 citations73
US10580623B2Mar 3, 2020
Plasma processing using multiple radio frequency power feeds for improved uniformity
APPLIED MATERIALS INC3 citations72
US10984990B2Apr 20, 2021
Electrode assembly
APPLIED MATERIALS INC4 citations71
US10113236B2Oct 30, 2018
Batch curing chamber with gas distribution and individual pumping
APPLIED MATERIALS INC2 citations71
US12203171B2Jan 21, 2025
Batch curing chamber with gas distribution and individual pumping
APPLIED MATERIALS INC0 citations62
US11276562B2Mar 15, 2022
Plasma processing using multiple radio frequency power feeds for improved uniformity
APPLIED MATERIALS INC0 citations62
US10916407B2Feb 9, 2021
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
APPLIED MATERIALS INC0 citations62
US10663491B2May 26, 2020
Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same
APPLIED MATERIALS INC1 citations62
US11408075B2Aug 9, 2022
Batch curing chamber with gas distribution and individual pumping
APPLIED MATERIALS INC0 citations61
US12460298B2Nov 4, 2025
Showerhead design to control stray deposition
APPLIED MATERIALS INC0 citations59
US10934620B2Mar 2, 2021
Integration of dual remote plasmas sources for flowable CVD
APPLIED MATERIALS INC0 citations51
US10510567B2Dec 17, 2019
Integrated substrate temperature measurement on high temperature ceramic heater
APPLIED MATERIALS INC0 citations50
US11984302B2May 14, 2024
Magnetic-material shield around plasma chambers near pedestal
APPLIED MATERIALS INC0 citations47