Inventor
KANG SANG-YEOL
KR35 patents
⚠️ This page may combine multiple inventors who share the name “KANG SANG-YEOL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
25 patentsUS7638787B2Dec 29, 2009
Phase changeable memory cell array region and method of forming the same
SAMSUNG ELECTRONICS CO LTD36 citations92
US9716094B2Jul 25, 2017
Semiconductor device having capacitor and method of fabricating the semiconductor device
SAMSUNG ELECTRONICS CO LTD7 citations84
US10978552B2Apr 13, 2021
Semiconductor devices and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD5 citations83
US8790986B2Jul 29, 2014
Methods of manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD7 citations82
US10825889B2Nov 3, 2020
Semiconductor device including capacitor and method of forming the same
SAMSUNG ELECTRONICS CO LTD3 citations73
US7759718B2Jul 20, 2010
Method manufacturing capacitor dielectric
SAMSUNG ELECTRONICS CO LTD7 citations73
US11488958B2Nov 1, 2022
Semiconductor device electrodes including fluorine
SAMSUNG ELECTRONICS CO LTD2 citations72
US11244946B2Feb 8, 2022
Semiconductor devices and methods for fabricating thereof
SAMSUNG ELECTRONICS CO LTD2 citations72
US10825893B2Nov 3, 2020
Semiconductor devices
SAMSUNG ELECTRONICS CO LTD5 citations72
US11812601B2Nov 7, 2023
Semiconductor device including an interface film
SAMSUNG ELECTRONICS CO LTD2 citations71
US11069768B2Jul 20, 2021
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD3 citations71
US11088240B2Aug 10, 2021
Capacitor structure
SAMSUNG ELECTRONICS CO LTD4 citations70
US8039298B2Oct 18, 2011
Phase changeable memory cell array region and method of forming the same
SAMSUNG ELECTRONICS CO LTD2 citations63
US12230667B2Feb 18, 2025
Semiconductor device including capacitor and method of forming the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11588012B2Feb 21, 2023
Semiconductor devices and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11411069B2Aug 9, 2022
Semiconductor device including capacitor and method of forming the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US7824501B2Nov 2, 2010
In-situ method of cleaning vaporizer during dielectric layer deposition process
SAMSUNG ELECTRONICS CO LTD2 citations62
US7791125B2Sep 7, 2010
Semiconductor devices having dielectric layers and methods of forming the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US12089397B2Sep 10, 2024
Semiconductor devices and methods for fabricating thereof
SAMSUNG ELECTRONICS CO LTD0 citations61
US11711915B2Jul 25, 2023
Semiconductor devices and methods for fabricating thereof
SAMSUNG ELECTRONICS CO LTD0 citations61
US11527604B2Dec 13, 2022
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations61
US7939872B2May 10, 2011
Multi-dielectric films for semiconductor devices and methods of fabricating multi-dielectric films
SAMSUNG ELECTRONICS CO LTD2 citations60
US11705483B2Jul 18, 2023
Capacitor structure and semiconductor devices having the same
SAMSUNG ELECTRONICS CO LTD0 citations59
US9685498B2Jun 20, 2017
Methods of forming dielectric layers and methods of manufacturing semiconductor devices using the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US12094924B2Sep 17, 2024
Capacitor structure, semiconductor memory device including the same, method for fabricating the same, and method for fabricating semiconductor memory device including the same
SAMSUNG ELECTRONICS CO LTD0 citations44