Inventor

BIYAJIMA YUSUKE

JP27 patents

⚠️ This page may combine multiple inventors who share the name “BIYAJIMA YUSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BIYAJIMA YUSUKE

SHINETSU CHEMICAL CO

Method for producing resist composition

Composition for forming silicon-containing resist underlayer film and patterning process

Method for producing semiconductor apparatus substrate

Resist underlayer film material, patterning process, and method for forming resist underlayer film

Composition for forming silicon-containing resist underlayer film and patterning process

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process

Composition for forming silicon-containing resist underlayer film and patterning process

Composition for forming silicon-containing resist underlayer film and patterning process

Composition for forming silicon-containing resist underlayer film and patterning process

Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process

Material for forming adhesive film, patterning process, and method for forming adhesive film

Method for measuring distance of diffusion of curing catalyst

Pattern forming process

Material for forming adhesive film, method for forming adhesive film using the same, and patterning process using material for forming adhesive film

Material for forming organic film, method for forming organic film, patterning process, and compound

Resist underlayer film material, patterning process, and method for forming resist underlayer film

Material for forming organic film, method for forming organic film, patterning process, and compound

Material for forming organic film, method for forming organic film, patterning process, and compound

Method for producing resist composition

Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition

Method for manufacturing a resist composition

Composition for forming a silicon-containing resist under layer film and patterning process

OGIHARA TSUTOMU

Resist underlayer film composition and patterning process using the same

Resist underlayer film composition and patterning process using the same

Resist underlayer film composition and patterning process using the same

Resist underlayer film composition and patterning process using the same