Inventor
NAKANISHI HIROTOSHI
JP23 patents
Patents
23 patentsUS5407779AApr 18, 1995
Positive resist composition
SUMITOMO CHEMICAL CO61 citations96
US4500721AFeb 19, 1985
Process for producing benzaldehydes
SUMITOMO CHEMICAL CO18 citations81
US5374742ADec 20, 1994
Positive resist composition
SUMITOMO CHEMICAL CO6 citations74
US5290657AMar 1, 1994
Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound
SUMITOMO CHEMICAL CO11 citations74
US5283155AFeb 1, 1994
Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
SUMITOMO CHEMICAL CO11 citations74
US5587492ADec 24, 1996
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO4 citations73
US5436107AJul 25, 1995
Positive resist composition
SUMITOMO CHEMICAL CO12 citations73
US5407778AApr 18, 1995
Positive resist composition
SUMITOMO CHEMICAL CO12 citations73
US5378586AJan 3, 1995
Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester
SUMITOMO CHEMICAL CO11 citations73
US5362598ANov 8, 1994
Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
SUMITOMO CHEMICAL CO7 citations73
US5290656AMar 1, 1994
Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
SUMITOMO CHEMICAL CO12 citations73
US5275910AJan 4, 1994
Positive radiation-sensitive resist composition
SUMITOMO CHEMICAL CO8 citations73
US5124228AJun 23, 1992
Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
SUMITOMO CHEMICAL CO8 citations73
US5080997AJan 14, 1992
Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture
SUMITOMO CHEMICAL CO13 citations73
US5059507AOct 22, 1991
Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin
SUMITOMO CHEMICAL CO18 citations72
US7220532B2May 22, 2007
Chemical amplification type resist composition
SUMITOMO CHEMICAL CO7 citations63
US5556995ASep 17, 1996
Process for the preparation of polyhydric phenol compounds
SUMITOMO CHEMICAL CO4 citations62
US5413895AMay 9, 1995
Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound.
SUMITOMO CHEMICAL CO4 citations62
US5283324AFeb 1, 1994
Process for preparing radiation sensitive compound and positive resist composition
SUMITOMO CHEMICAL CO6 citations62
US4220592ASep 2, 1980
Synthesis of substituted phenylacetic acid
SUMITOMO CHEMICAL CO3 citations58
US5591871AJan 7, 1997
Bislactone compound and a process for producing the same
SUMITOMO CHEMICAL CO3 citations57
US3956385AMay 11, 1976
Process for producing sulfonylamides
SUMITOMO CHEMICAL CO4 citations54
US5714620AFeb 3, 1998
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO0 citations51