Inventor

OI FUMIO

JP14 patents

⚠️ This page may combine multiple inventors who share the name “OI FUMIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUMITOMO CHEMICAL CO

9 patents

US4812551AMar 14, 1989

Novolak resin for positive photoresist

SUMITOMO CHEMICAL CO56 citations95

US5861229AJan 19, 1999

Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound

SUMITOMO CHEMICAL CO7 citations73

US5378586AJan 3, 1995

Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester

SUMITOMO CHEMICAL CO11 citations73

US5290656AMar 1, 1994

Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound

SUMITOMO CHEMICAL CO12 citations73

US5124228AJun 23, 1992

Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester

SUMITOMO CHEMICAL CO8 citations73

US5080997AJan 14, 1992

Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture

SUMITOMO CHEMICAL CO13 citations73

US5456995AOct 10, 1995

Radiation-sensitive positive resist composition

SUMITOMO CHEMICAL CO14 citations72

US5456996AOct 10, 1995

Radiation-sensitive positive resist composition

SUMITOMO CHEMICAL CO12 citations72

US5059507AOct 22, 1991

Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin

SUMITOMO CHEMICAL CO18 citations72

KONISHI CHEM IND

4 patents

US7456321B2Nov 25, 2008

MA CHENGHUAN

1 patent

US8088863B2Jan 3, 2012

Organic-solvent dispersion of fine polysilsesquioxane particle, process for producing the same, aqueous dispersion of fine polysilsesquioxane particle, and process for producing the same

MA CHENGHUAN0 citations38

OI FUMIO

SUMITOMO CHEMICAL CO

Novolak resin for positive photoresist

Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound

Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester

Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound

Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester

Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition

Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin

KONISHI CHEM IND

Process for producing high-purity 4,4′-dihydroxydiphenyl sulfone

Process for producing mixture of dihydroxydiphenylsulfone isomers

Process for producing mixture of dihydroxydiphenylsulfone isomers

Process for producing dihydroxydiphenylsulfone

MA CHENGHUAN

Organic-solvent dispersion of fine polysilsesquioxane particle, process for producing the same, aqueous dispersion of fine polysilsesquioxane particle, and process for producing the same