P

Inventor

SUNG JANMYE

TW34 patents
⚠️ This page may combine multiple inventors who share the name “SUNG JANMYE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VANGUARD INT SEMICONDUCT CORP

19 patents
US5943581AAug 24, 1999

Method of fabricating a buried reservoir capacitor structure for high-density dynamic random access memory (DRAM) circuits

VANGUARD INT SEMICONDUCT CORP322 citations99
US5858831AJan 12, 1999

Process for fabricating a high performance logic and embedded dram devices on a single semiconductor chip

VANGUARD INT SEMICONDUCT CORP118 citations98
US6136643AOct 24, 2000

Method for fabricating capacitor-over-bit-line dynamic random access memory (DRAM) using self-aligned contact etching technology

VANGUARD INT SEMICONDUCT CORP76 citations96
US6008084ADec 28, 1999

Method for fabricating low resistance bit line structures, along with bit line structures exhibiting low bit line to bit line coupling capacitance

VANGUARD INT SEMICONDUCT CORP74 citations96
US5550078AAug 27, 1996

Reduced mask DRAM process

VANGUARD INT SEMICONDUCT CORP63 citations96
US5547893AAug 20, 1996

method for fabricating an embedded vertical bipolar transistor and a memory cell

VANGUARD INT SEMICONDUCT CORP77 citations96
US6180453B1Jan 30, 2001

Method to fabricate a DRAM cell with an area equal to five times the minimum used feature, squared

VANGUARD INT SEMICONDUCT CORP53 citations93
US5821142AOct 13, 1998

Method for forming a capacitor with a multiple pillar structure

VANGUARD INT SEMICONDUCT CORP35 citations93
US6025227AFeb 15, 2000

Capacitor over bit line structure using a straight bit line shape

VANGUARD INT SEMICONDUCT CORP21 citations92
US6008085ADec 28, 1999

Design and a novel process for formation of DRAM bit line and capacitor node contacts

VANGUARD INT SEMICONDUCT CORP39 citations92
US5792680AAug 11, 1998

Method of forming a low cost DRAM cell with self aligned twin tub CMOS devices and a pillar shaped capacitor

VANGUARD INT SEMICONDUCT CORP44 citations92
US5789291AAug 4, 1998

Dram cell capacitor fabrication method

VANGUARD INT SEMICONDUCT CORP26 citations92
US5753551AMay 19, 1998

Memory cell array with a self-aligned, buried bit line

VANGUARD INT SEMICONDUCT CORP41 citations92
US5573962ANov 12, 1996

Low cycle time CMOS process

VANGUARD INT SEMICONDUCT CORP22 citations92
US6137130AOct 24, 2000

Capacitor over bit line structure using a straight bit line shape

VANGUARD INT SEMICONDUCT CORP16 citations84
US6163047ADec 19, 2000

Method of fabricating a self aligned contact for a capacitor over bitline, (COB), memory cell

VANGUARD INT SEMICONDUCT CORP17 citations82
US6198121B1Mar 6, 2001

Method fabricating a DRAM cell with an area equal to four times the used minimum feature

VANGUARD INT SEMICONDUCT CORP9 citations74
US5808335ASep 15, 1998

Reduced mask DRAM process

VANGUARD INT SEMICONDUCT CORP15 citations74
US5729056AMar 17, 1998

Low cycle time CMOS process

VANGUARD INT SEMICONDUCT CORP8 citations74

AT & T BELL LAB

7 patents

LUCENT TECHNOLOGIES INC

4 patents

AT & T CORP

3 patents

VANGAURD INTERNATIONAL SEMICON

1 patent