Inventor
SUNG JANMYE
TW34 patents
⚠️ This page may combine multiple inventors who share the name “SUNG JANMYE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VANGUARD INT SEMICONDUCT CORP
19 patentsUS5943581AAug 24, 1999
Method of fabricating a buried reservoir capacitor structure for high-density dynamic random access memory (DRAM) circuits
VANGUARD INT SEMICONDUCT CORP322 citations99
US5858831AJan 12, 1999
Process for fabricating a high performance logic and embedded dram devices on a single semiconductor chip
VANGUARD INT SEMICONDUCT CORP118 citations98
US6136643AOct 24, 2000
Method for fabricating capacitor-over-bit-line dynamic random access memory (DRAM) using self-aligned contact etching technology
VANGUARD INT SEMICONDUCT CORP76 citations96
US6008084ADec 28, 1999
Method for fabricating low resistance bit line structures, along with bit line structures exhibiting low bit line to bit line coupling capacitance
VANGUARD INT SEMICONDUCT CORP74 citations96
US5550078AAug 27, 1996
Reduced mask DRAM process
VANGUARD INT SEMICONDUCT CORP63 citations96
US5547893AAug 20, 1996
method for fabricating an embedded vertical bipolar transistor and a memory cell
VANGUARD INT SEMICONDUCT CORP77 citations96
US6180453B1Jan 30, 2001
Method to fabricate a DRAM cell with an area equal to five times the minimum used feature, squared
VANGUARD INT SEMICONDUCT CORP53 citations93
US5821142AOct 13, 1998
Method for forming a capacitor with a multiple pillar structure
VANGUARD INT SEMICONDUCT CORP35 citations93
US6025227AFeb 15, 2000
Capacitor over bit line structure using a straight bit line shape
VANGUARD INT SEMICONDUCT CORP21 citations92
US6008085ADec 28, 1999
Design and a novel process for formation of DRAM bit line and capacitor node contacts
VANGUARD INT SEMICONDUCT CORP39 citations92
US5792680AAug 11, 1998
Method of forming a low cost DRAM cell with self aligned twin tub CMOS devices and a pillar shaped capacitor
VANGUARD INT SEMICONDUCT CORP44 citations92
US5789291AAug 4, 1998
Dram cell capacitor fabrication method
VANGUARD INT SEMICONDUCT CORP26 citations92
US5753551AMay 19, 1998
Memory cell array with a self-aligned, buried bit line
VANGUARD INT SEMICONDUCT CORP41 citations92
US5573962ANov 12, 1996
Low cycle time CMOS process
VANGUARD INT SEMICONDUCT CORP22 citations92
US6137130AOct 24, 2000
Capacitor over bit line structure using a straight bit line shape
VANGUARD INT SEMICONDUCT CORP16 citations84
US6163047ADec 19, 2000
Method of fabricating a self aligned contact for a capacitor over bitline, (COB), memory cell
VANGUARD INT SEMICONDUCT CORP17 citations82
US6198121B1Mar 6, 2001
Method fabricating a DRAM cell with an area equal to four times the used minimum feature
VANGUARD INT SEMICONDUCT CORP9 citations74
US5808335ASep 15, 1998
Reduced mask DRAM process
VANGUARD INT SEMICONDUCT CORP15 citations74
US5729056AMar 17, 1998
Low cycle time CMOS process
VANGUARD INT SEMICONDUCT CORP8 citations74
AT & T BELL LAB
7 patentsUS5153145AOct 6, 1992
Fet with gate spacer
AT & T BELL LAB61 citations96
US5353245AOct 4, 1994
Memory integrated circuit with balanced resistance
AT & T BELL LAB13 citations74
US5002898AMar 26, 1991
Integrated-circuit device isolation
AT & T BELL LAB13 citations73
US4935376AJun 19, 1990
Making silicide gate level runners
AT & T BELL LAB7 citations73
US4999317AMar 12, 1991
Metallization processing
AT & T BELL LAB16 citations69
US5334541AAug 2, 1994
Method of fabricating an integrated circuit with lines of critical width extending in the astigmatically preferred direction of the lithographic tool
AT & T BELL LAB2 citations62
US5128738AJul 7, 1992
Integrated circuit
AT & T BELL LAB6 citations62
LUCENT TECHNOLOGIES INC
4 patentsUS5679589AOct 21, 1997
FET with gate spacer
LUCENT TECHNOLOGIES INC38 citations93
US5559360ASep 24, 1996
Inductor for high frequency circuits
LUCENT TECHNOLOGIES INC86 citations92
US5879997AMar 9, 1999
Method for forming self aligned polysilicon contact
LUCENT TECHNOLOGIES INC12 citations74
US5656510AAug 12, 1997
Method for manufacturing gate oxide capacitors including wafer backside dielectric and implantation electron flood gun current control
LUCENT TECHNOLOGIES INC8 citations62