Inventor
SOHN JUNG-MIN
KR17 patents
⚠️ This page may combine multiple inventors who share the name “SOHN JUNG-MIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LG CHEMICAL LTD
14 patentsUS10550230B2Feb 4, 2020
Preparation method of superabsorbent polymer and superabsorbent polymer prepared thereby
LG CHEMICAL LTD2 citations72
US12053757B2Aug 6, 2024
Super absorbent polymer and method for producing same
LG CHEMICAL LTD0 citations62
US11358121B2Jun 14, 2022
Super absorbent polymer and method for producing same
LG CHEMICAL LTD0 citations62
US11142615B2Oct 12, 2021
Super absorbent polymer and method for preparing same
LG CHEMICAL LTD0 citations62
US11066496B2Jul 20, 2021
Super absorbent polymer and method for preparing same
LG CHEMICAL LTD1 citations62
US10975196B2Apr 13, 2021
Method for purifying polyalkylene carbonate
LG CHEMICAL LTD0 citations51
US9382386B2Jul 5, 2016
Lactide copolymer, method for preparing same, and resin composition comprising same
LG CHEMICAL LTD1 citations51
US9382385B2Jul 5, 2016
Lactide copolymer, and resin composition and film comprising same
LG CHEMICAL LTD1 citations51
US9074042B2Jul 7, 2015
Packaging film including a lactide copolymer
LG CHEMICAL LTD1 citations50
US9062147B2Jun 23, 2015
Lactide copolymer, a preparation method thereof, and a resin composition including the same
LG CHEMICAL LTD1 citations50
US9663654B2May 30, 2017
Resin composition comprising polyalkylene carbonate
LG CHEMICAL LTD1 citations49
US9580566B2Feb 28, 2017
Oriented film
LG CHEMICAL LTD0 citations41
US10829635B2Nov 10, 2020
Economical method of preparing a resin composition including polyalkylene carbonate with improved thermal stability and processability
LG CHEMICAL LTD0 citations40
US10457773B2Oct 29, 2019
Method of preparing polyalkylene carbonate resin
LG CHEMICAL LTD0 citations40
SAMSUNG ELECTRONICS CO LTD
3 patentsUS6835507B2Dec 28, 2004
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
SAMSUNG ELECTRONICS CO LTD19 citations82
US6866968B2Mar 15, 2005
Photomask for off-axis illumination and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD9 citations73
US7393615B2Jul 1, 2008
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
SAMSUNG ELECTRONICS CO LTD2 citations60