Inventor
SHIN IN-KYUN
KR18 patents
⚠️ This page may combine multiple inventors who share the name “SHIN IN-KYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
16 patentsUS5741613AApr 21, 1998
Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering
SAMSUNG ELECTRONICS CO LTD44 citations91
US10012900B2Jul 3, 2018
Method of correcting mask pattern and method of manufacturing reticle
SAMSUNG ELECTRONICS CO LTD12 citations84
US6866968B2Mar 15, 2005
Photomask for off-axis illumination and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD9 citations73
US5853921ADec 29, 1998
Methods of fabricating phase shift masks by controlling exposure doses
SAMSUNG ELECTRONICS CO LTD15 citations72
US5814424ASep 29, 1998
Half tone phase shift masks with staircase regions and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US7389491B2Jun 17, 2008
Methods, systems and computer program products for correcting photomask using aerial images and boundary regions
SAMSUNG ELECTRONICS CO LTD5 citations60
US7338736B2Mar 4, 2008
Method of fabricating a phase shift mask
SAMSUNG ELECTRONICS CO LTD4 citations59
US7112390B2Sep 26, 2006
Method of manufacturing chromeless phase shift mask
SAMSUNG ELECTRONICS CO LTD5 citations59
US7432022B2Oct 7, 2008
Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations58
US7387965B2Jun 17, 2008
Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US7335449B2Feb 26, 2008
Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD1 citations49
US7541118B2Jun 2, 2009
Phase shift mask
SAMSUNG ELECTRONICS CO LTD0 citations48
US6919149B2Jul 19, 2005
Wave guided alternating phase shift mask and fabrication method thereof
SAMSUNG ELECTRONICS CO LTD1 citations47
US9583305B2Feb 28, 2017
Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same
SAMSUNG ELECTRONICS CO LTD0 citations38
US7100322B2Sep 5, 2006
Method of manufacturing an alternating phase shift mask
SAMSUNG ELECTRONICS CO LTD0 citations38
US7595136B2Sep 29, 2009
Method of fabricating chrome-less phase shift mask
SAMSUNG ELECTRONICS CO LTD0 citations37