P

Inventor

SHIN IN-KYUN

KR18 patents
⚠️ This page may combine multiple inventors who share the name “SHIN IN-KYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

16 patents
US5741613AApr 21, 1998

Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering

SAMSUNG ELECTRONICS CO LTD44 citations91
US10012900B2Jul 3, 2018

Method of correcting mask pattern and method of manufacturing reticle

SAMSUNG ELECTRONICS CO LTD12 citations84
US6866968B2Mar 15, 2005

Photomask for off-axis illumination and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD9 citations73
US5853921ADec 29, 1998

Methods of fabricating phase shift masks by controlling exposure doses

SAMSUNG ELECTRONICS CO LTD15 citations72
US5814424ASep 29, 1998

Half tone phase shift masks with staircase regions and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD2 citations62
US7389491B2Jun 17, 2008

Methods, systems and computer program products for correcting photomask using aerial images and boundary regions

SAMSUNG ELECTRONICS CO LTD5 citations60
US7338736B2Mar 4, 2008

Method of fabricating a phase shift mask

SAMSUNG ELECTRONICS CO LTD4 citations59
US7112390B2Sep 26, 2006

Method of manufacturing chromeless phase shift mask

SAMSUNG ELECTRONICS CO LTD5 citations59
US7432022B2Oct 7, 2008

Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD4 citations58
US7387965B2Jun 17, 2008

Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same

SAMSUNG ELECTRONICS CO LTD1 citations52
US7335449B2Feb 26, 2008

Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD1 citations49
US7541118B2Jun 2, 2009

Phase shift mask

SAMSUNG ELECTRONICS CO LTD0 citations48
US6919149B2Jul 19, 2005

Wave guided alternating phase shift mask and fabrication method thereof

SAMSUNG ELECTRONICS CO LTD1 citations47
US9583305B2Feb 28, 2017

Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same

SAMSUNG ELECTRONICS CO LTD0 citations38
US7100322B2Sep 5, 2006

Method of manufacturing an alternating phase shift mask

SAMSUNG ELECTRONICS CO LTD0 citations38
US7595136B2Sep 29, 2009

Method of fabricating chrome-less phase shift mask

SAMSUNG ELECTRONICS CO LTD0 citations37

CHOI JIN

1 patent

KIM SUNG-HYUCK

1 patent