Inventor
TSUKAMOTO YUJI
US27 patents
⚠️ This page may combine multiple inventors who share the name “TSUKAMOTO YUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
12 patentsUS6341053B1Jan 22, 2002
Magnetic tunnel junction elements and their fabrication method
NEC CORP81 citations98
US4856326AAug 15, 1989
Apparatus for measuring an adhesion force of a thin film
NEC CORP62 citations96
US6333842B1Dec 25, 2001
Magneto-resistance effect type composite head and production method thereof
NEC CORP49 citations94
US5781376AJul 14, 1998
Magnetic head with polycrystalline silicon layer on slide running surface
NEC CORP25 citations92
US4839244AJun 13, 1989
Magnetic recording medium with protective layer using graphite fluoride and method of producing same
NEC CORP28 citations92
US6174736B1Jan 16, 2001
Method of fabricating ferromagnetic tunnel junction device
NEC CORP17 citations84
US5994035ANov 30, 1999
Method of producing magnetic head slider of the flying type having a protective coating
NEC CORP18 citations83
US6330124B1Dec 11, 2001
Magnetic disk device using a contact start stop system
NEC CORP12 citations73
US5447796ASep 5, 1995
Magnetic recording medium comprising a solid lubrication layer of fullerene carbon having an alkyl or allyl chain
NEC CORP14 citations73
US6639766B2Oct 28, 2003
Magneto-resistance effect type composite head and production method thereof
NEC CORP8 citations71
US4758474AJul 19, 1988
Magnetic recording member
NEC CORP2 citations63
US6181503B1Jan 30, 2001
Magnetic disk device using a contact start stop system
NEC CORP2 citations62
TOKYO ELECTRON LTD
8 patentsUS7723648B2May 25, 2010
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
TOKYO ELECTRON LTD551 citations99
US5868848AFeb 9, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD158 citations99
US7952049B2May 31, 2011
Method for multi-step temperature control of a substrate
TOKYO ELECTRON LTD52 citations98
US7297894B1Nov 20, 2007
Method for multi-step temperature control of a substrate
TOKYO ELECTRON LTD120 citations98
US7164236B2Jan 16, 2007
Method and apparatus for improved plasma processing uniformity
TOKYO ELECTRON LTD66 citations97
US7230204B2Jun 12, 2007
Method and system for temperature control of a substrate
TOKYO ELECTRON LTD54 citations95
US8034176B2Oct 11, 2011
Gas distribution system for a post-etch treatment system
TOKYO ELECTRON LTD9 citations82
US7838800B2Nov 23, 2010
Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system
TOKYO ELECTRON LTD6 citations74
TSUKAMOTO YUJI
3 patentsUS8207476B2Jun 26, 2012
Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
TSUKAMOTO YUJI14 citations83
US8057633B2Nov 15, 2011
Post-etch treatment system for removing residue on a substrate
TSUKAMOTO YUJI7 citations81
US8450657B2May 28, 2013
Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system
TSUKAMOTO YUJI0 citations51