Inventor

OKURA SEIJI

JP35 patents

⚠️ This page may combine multiple inventors who share the name “OKURA SEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OKURA SEIJI

FUJITSU LTD

Apparatus, method, and computer-readable medium for language translation

Evaluation apparatus with voting system, evaluation method with voting system, and a computer product

Information searching apparatus for displaying an expansion history and its method

Retrieval device and method

Encoding device, encoding method and search method

Method and apparatus for generating context information

Reservation managing method, and information processing device, and non-transitory computer-readable storage medium for storing reservation managing program

Non-transitory computer readable recording medium, identification method, generation method, and information processing device

Translation support device

Translation correlation device

Extraction method, computer-readable recording medium storing extraction program, and information processing device

Effective retrieval of text data based on semantic attributes between morphemes

Index generation method, data retrieval method, apparatus of index generation

Semantic structure search device and semantic structure search method

Alignment generation device and alignment generation method

Search method and search device

Non-transitory computer-readable storage medium, analysis method, and analysis device

Encoding apparatus, encoding method and search method

Search apparatus and search method

Search apparatus, encoding method, and search method based on morpheme position in a target document

Computer program, apparatus, and method for searching translation memory and displaying search result

ASM IP HOLDING BV

Process for deposition of titanium oxynitride for use in integrated circuit fabrication

Oxide film forming method

Deposition of titanium nanolaminates for use in integrated circuit fabrication

Process for deposition of titanium oxynitride for use in integrated circuit fabrication

Process for deposition of titanium oxynitride for use in integrated circuit fabrication

Process for deposition of titanium oxynitride for use in integrated circuit fabrication

Process for deposition of titanium oxynitride for use in integrated circuit fabrication

RENESAS TECH CORP

Semiconductor device with a fluorinated silicate glass film as an interlayer metal dielectric film, and manufacturing method thereof

Method of manufacturing semiconductor device having passivation film and buffer coating film

MITSUBISHI ELECTRIC CORP

Semiconductor device with a fluorinated silicate glass film as an interlayer metal dielectric film, and manufacturing method thereof

NAT INST OF ADVANCED IND SCIEN

Device for cleaning CVD device and method of cleaning CVD device

OKURA SEIJI

Translation supporting program, apparatus, and method

SAKAI KATSUO

CVD apparatus and method of cleaning the CVD apparatus

FUJI MASARU

Computer-readable medium having sentence dividing program stored thereon, sentence dividing apparatus, and sentence dividing method