Inventor
KOOLE ROELOF
NL35 patents
⚠️ This page may combine multiple inventors who share the name “KOOLE ROELOF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KONINKLIJKE PHILIPS NV
7 patentsUS10035952B2Jul 31, 2018
PDMS-based ligands for quantum dots in silicones
KONINKLIJKE PHILIPS NV6 citations73
US10050184B2Aug 14, 2018
Quantum dots with reduced saturation quenching
KONINKLIJKE PHILIPS NV3 citations71
US10030851B2Jul 24, 2018
Encapsulated quantum dots in porous particles
KONINKLIJKE PHILIPS NV6 citations71
US9622818B2Apr 18, 2017
LIOB based hair cutting device
KONINKLIJKE PHILIPS NV2 citations70
US10156325B2Dec 18, 2018
Quantum dots in enclosed environment
KONINKLIJKE PHILIPS NV0 citations49
US10190042B2Jan 29, 2019
Silicone product, a lighting unit comprising the silicone product and method of manufacturing a silicone product
KONINKLIJKE PHILIPS NV0 citations48
US9568464B2Feb 14, 2017
Manufacturing method of an apparatus for the processing of single molecules
KONINKLIJKE PHILIPS NV1 citations48
KOOLE ROELOF
5 patentsUS8828253B2Sep 9, 2014
Lithography using self-assembled polymers
KOOLE ROELOF8 citations83
US9547234B2Jan 17, 2017
Imprint lithography apparatus and method
KOOLE ROELOF2 citations72
US8404170B2Mar 26, 2013
Imprint lithography apparatus and method
KOOLE ROELOF2 citations61
US9274441B2Mar 1, 2016
Inspection method for imprint lithography and apparatus therefor
KOOLE ROELOF0 citations51
US9011978B2Apr 21, 2015
Method and apparatus for treatment of self-assemblable polymer layers for use in lithography
KOOLE ROELOF0 citations51
ASML NETHERLANDS BV
5 patentsUS9235125B2Jan 12, 2016
Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography
ASML NETHERLANDS BV4 citations70
US10240250B2Mar 26, 2019
Method to provide a patterned orientation template for a self-assemblable polymer
ASML NETHERLANDS BV1 citations58
US9513553B2Dec 6, 2016
Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography
ASML NETHERLANDS BV1 citations52
US9278466B2Mar 8, 2016
Imprint lithography method and apparatus
ASML NETHERLANDS BV0 citations52
US9229324B2Jan 5, 2016
Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography
ASML NETHERLANDS BV0 citations42
LUMILEDS LLC
3 patentsUS10287490B2May 14, 2019
PDMS-based ligands for quantum dots in silicones
LUMILEDS LLC8 citations84
US10340427B2Jul 2, 2019
Quantum dots with inorganic ligands in an inorganic matrix
LUMILEDS LLC2 citations71
US10578257B2Mar 3, 2020
Silica coated quantum dots with improved quantum efficiency
LUMILEDS LLC1 citations57
PEETERS EMIEL
3 patentsUS8822139B2Sep 2, 2014
Method for providing an ordered layer of self-assemblable polymer for use in lithography
PEETERS EMIEL2 citations60
US10538859B2Jan 21, 2020
Methods for providing patterned orientation templates for self-assemblable polymers for use in device lithography
PEETERS EMIEL1 citations59
US8921032B2Dec 30, 2014
Self-assemblable polymer and method for use in lithography
PEETERS EMIEL0 citations50