Inventor
HIRAI TOSHIMITSU
JP77 patents
⚠️ This page may combine multiple inventors who share the name “HIRAI TOSHIMITSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
45 patentsUS6861377B1Mar 1, 2005
Surface treatment method, surface-treated substrate, method for forming film pattern, method for making electro-optical device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP50 citations96
US7220682B2May 22, 2007
Pattern and fabricating method therefor, device and fabricating method therefor, electro-optical apparatus, electronic apparatus, and method for fabricating active matrix substrate
SEIKO EPSON CORP20 citations93
US7138304B2Nov 21, 2006
Method for forming thin film pattern, device and production method therefor, electro-optical apparatus and electronic apparatus, and production method for active matrix substrate
SEIKO EPSON CORP33 citations93
US7199033B2Apr 3, 2007
Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus
SEIKO EPSON CORP25 citations92
US7090966B2Aug 15, 2006
Process of surface treatment, surface treating device, surface treated plate, and electro-optic device, and electronic equipment
SEIKO EPSON CORP17 citations92
US6861279B2Mar 1, 2005
Method of manufacturing electro-optical device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP35 citations92
US9393740B2Jul 19, 2016
Method of producing three-dimensional structure, apparatus for producing three-dimensional structure, and three-dimensional structure
SEIKO EPSON CORP18 citations84
US7582333B2Sep 1, 2009
Pattern forming method, pattern forming apparatus, method of manufacturing device, conductive film wiring, electro-optical device, and electronic apparatus
SEIKO EPSON CORP9 citations84
US7365008B2Apr 29, 2008
Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus
SEIKO EPSON CORP9 citations84
US7364622B2Apr 29, 2008
Method and apparatus for fabricating a device, and the device and an electronic equipment
SEIKO EPSON CORP14 citations84
US7214617B2May 8, 2007
Method of forming thin film pattern, method of manufacturing device, electro-optical apparatus and electronic apparatus
SEIKO EPSON CORP12 citations84
US7477336B2Jan 13, 2009
Active matrix substrate, method of manufacturing active matrix substrate, electro-optical device, and electronic apparatus
SEIKO EPSON CORP10 citations83
US7410905B2Aug 12, 2008
Method for fabricating thin film pattern, device and fabricating method therefor, method for fabricating liquid crystal display, liquid crystal display, method for fabricating active matrix substrate, electro-optical apparatus, and electrical apparatus
SEIKO EPSON CORP13 citations83
US7678697B2Mar 16, 2010
Substrate, device, method of manufacturing device, method of manufacturing active matrix substrate, electro-optical apparatus and electronic apparatus
SEIKO EPSON CORP7 citations74
US7326585B2Feb 5, 2008
Forming process of thin film pattern and manufacturing process of device, electro-optical apparatus and electronic apparatus
SEIKO EPSON CORP8 citations74
US7198821B2Apr 3, 2007
Method of manufacturing a device, device, and electronic apparatus
SEIKO EPSON CORP8 citations74
US11565314B2Jan 31, 2023
Three-dimensional shaped article production method
SEIKO EPSON CORP1 citations73
US10814389B2Oct 27, 2020
Three-dimensional shaped article production method
SEIKO EPSON CORP2 citations73
US7582545B2Sep 1, 2009
Forming method for film pattern, device, electro-optical apparatus, electronic apparatus, and manufacturing method for active matrix substrate
SEIKO EPSON CORP7 citations73
US11878460B2Jan 23, 2024
Three-dimensional shaped article production method
SEIKO EPSON CORP0 citations63
US8796913B2Aug 5, 2014
Method of manufacturing an electric optical device in which external connection terminals are formed
SEIKO EPSON CORP1 citations63
US7713578B2May 11, 2010
Method for fabricating thin film pattern, method for fabricating device, electro-optical apparatus, and electronic apparatus
SEIKO EPSON CORP6 citations63
US7595137B2Sep 29, 2009
Method of manufacturing color filter substrate, color filter substrate, display device and electronic apparatus
SEIKO EPSON CORP4 citations63
US7399560B2Jul 15, 2008
Method for manufacturing mask, method for manufacturing wiring pattern, and method for manufacturing plasma display
SEIKO EPSON CORP2 citations63
US7326460B2Feb 5, 2008
Device, method of manufacturing the same, electro-optic device, and electronic equipment
SEIKO EPSON CORP6 citations63
US7278725B2Oct 9, 2007
Layer forming method, layer forming apparatus, device, manufacturing method for device, and electronic apparatus
SEIKO EPSON CORP2 citations63
US12415319B2Sep 16, 2025
Three-dimensional shaping device with nozzle flushing operation
SEIKO EPSON CORP0 citations62
US11738512B2Aug 29, 2023
Three-dimensional shaped article production apparatus
SEIKO EPSON CORP0 citations62
US11485084B2Nov 1, 2022
Three-dimensional shaped article production apparatus
SEIKO EPSON CORP0 citations62
US7799407B2Sep 21, 2010
Bank structure, wiring pattern forming method, device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP2 citations62
US7771246B2Aug 10, 2010
Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus
SEIKO EPSON CORP3 citations62
US7622385B2Nov 24, 2009
Wiring pattern forming method, film pattern forming method, semiconductor device, electro-optical device, and electronic equipment
SEIKO EPSON CORP2 citations62
US7556991B2Jul 7, 2009
Method for manufacturing thin film transistor, electro-optical device, and electronic apparatus
SEIKO EPSON CORP4 citations62
US7547567B2Jun 16, 2009
Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP5 citations62
US7371698B2May 13, 2008
Method of forming film pattern, active matrix substrate, electro-optic device, and electronic apparatus
SEIKO EPSON CORP6 citations62
US7335991B2Feb 26, 2008
Pattern forming structure, pattern forming method, device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP4 citations62
US7294566B2Nov 13, 2007
Method for forming wiring pattern, method for manufacturing device, device, electro-optic apparatus, and electronic equipment
SEIKO EPSON CORP6 citations62
US12459206B2Nov 4, 2025
Three-dimensional shaping device
SEIKO EPSON CORP0 citations52
US12280534B2Apr 22, 2025
Method of manufacturing three-dimensionally formed object and three-dimensionally formed object manufacturing apparatus
SEIKO EPSON CORP0 citations52
US12103083B2Oct 1, 2024
Three-dimensional shaped article production method
SEIKO EPSON CORP0 citations52
US12076923B2Sep 3, 2024
Three-dimensional shaping device
SEIKO EPSON CORP0 citations52
US11999108B2Jun 4, 2024
Three-dimensional shaping device
SEIKO EPSON CORP0 citations52
US11826826B2Nov 28, 2023
Three-dimensional shaping apparatus
SEIKO EPSON CORP0 citations52
US11745418B2Sep 5, 2023
Method of manufacturing three-dimensionally formed object and three-dimensionally formed object manufacturing apparatus
SEIKO EPSON CORP0 citations52
US11426796B2Aug 30, 2022
Metal shaped article production method
SEIKO EPSON CORP0 citations52
NAKANISHI HAYATO
2 patentsUS8253320B2Aug 28, 2012
Method of manufacturing an electric optical device in which external connection terminals are formed
NAKANISHI HAYATO11 citations83
US8339030B2Dec 25, 2012
Method of manufacturing an electric optical device in which external connection terminals are formed
NAKANISHI HAYATO4 citations62
OKAMOTO EIJI
1 patentFUTURE VISION INC
1 patentHASEI HIRONORI
1 patentShowing the top 50 of 77 patents by PatentIndex Score.