Inventor
IGETA MASANOBU
JP11 patents
Patents
11 patentsUS7129185B2Oct 31, 2006
Substrate processing method and a computer readable storage medium storing a program for controlling same
TOKYO ELECTRON LTD36 citations92
US6927112B2Aug 9, 2005
Radical processing of a sub-nanometer insulation film
TOKYO ELECTRON LTD27 citations92
US7754293B2Jul 13, 2010
Film forming method
TOKYO ELECTRON LTD9 citations83
US8853100B2Oct 7, 2014
Film formation method, film formation apparatus and storage medium
TOKYO ELECTRON LTD9 citations82
US7125799B2Oct 24, 2006
Method and device for processing substrate, and apparatus for manufacturing semiconductor device
TOKYO ELECTRON LTD8 citations73
US7497964B2Mar 3, 2009
Plasma igniting method and substrate processing method
TOKYO ELECTRON LTD4 citations62
US7378358B2May 27, 2008
Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus
TOKYO ELECTRON LTD3 citations62
US11605712B2Mar 14, 2023
Fabrication process flow of dielectric layer for isolation of nano-sheet devices on bulk silicon substrate
TOKYO ELECTRON LTD0 citations60
US7501352B2Mar 10, 2009
Method and system for forming an oxynitride layer
TOKYO ELECTRON LTD3 citations58
US11823910B2Nov 21, 2023
Systems and methods for improving planarity using selective atomic layer etching (ALE)
TOKYO ELECTRON LTD0 citations51
US10700009B2Jun 30, 2020
Ruthenium metal feature fill for interconnects
TOKYO ELECTRON LTD0 citations51