P

Inventor

NAKAYAMA IZUMI

JP10 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA IZUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ULVAC CORP

6 patents
US5244501ASep 14, 1993

Apparatus for chemical vapor deposition

ULVAC CORP65 citations94
US4924807AMay 15, 1990

Apparatus for chemical vapor deposition

ULVAC CORP62 citations94
US4902531AFeb 20, 1990

Vacuum processing method and apparatus

ULVAC CORP45 citations94
US5851589ADec 22, 1998

Method for thermal chemical vapor deposition

ULVAC CORP41 citations92
US4800105AJan 24, 1989

Method of forming a thin film by chemical vapor deposition

ULVAC CORP47 citations92
US5125360AJun 30, 1992

Vacuum processing apparatus

ULVAC CORP27 citations91

ULVAC TECHNOLOGIES INC

1 patent
US5795831AAug 18, 1998

Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers

ULVAC TECHNOLOGIES INC67 citations94

NIHON SINKU GIJUTSU KABUSIKI K

1 patent
US4994301AFeb 19, 1991

ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate

NIHON SINKU GIJUTSU KABUSIKI K45 citations91

VACUUM METALLURG CO LTD

1 patent
US5953629ASep 14, 1999

Method of thin film forming on semiconductor substrate

VACUUM METALLURG CO LTD43 citations90

NIHON SINKU GIJUTSU KABUSHIKI

1 patent
US4849260AJul 18, 1989

Method for selectively depositing metal on a substrate

NIHON SINKU GIJUTSU KABUSHIKI41 citations90