Inventor
KARWACKI JR EUGENE JOSEPH
US34 patents
⚠️ This page may combine multiple inventors who share the name “KARWACKI JR EUGENE JOSEPH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIR PROD & CHEM
22 patentsUS7357138B2Apr 15, 2008
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
AIR PROD & CHEM559 citations98
US7332445B2Feb 19, 2008
Porous low dielectric constant compositions and methods for making and using same
AIR PROD & CHEM65 citations98
US7098149B2Aug 29, 2006
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
AIR PROD & CHEM624 citations98
US7055263B2Jun 6, 2006
Method for cleaning deposition chambers for high dielectric constant materials
AIR PROD & CHEM385 citations98
US7404990B2Jul 29, 2008
Non-thermal process for forming porous low dielectric constant films
AIR PROD & CHEM47 citations96
US7129199B2Oct 31, 2006
Process solutions containing surfactants
AIR PROD & CHEM63 citations96
US6686594B2Feb 3, 2004
On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoring
AIR PROD & CHEM53 citations94
US7468290B2Dec 23, 2008
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
AIR PROD & CHEM33 citations92
US7285154B2Oct 23, 2007
Xenon recovery system
AIR PROD & CHEM42 citations92
US6783868B2Aug 31, 2004
Halogen addition for improved adhesion of CVD copper to barrier
AIR PROD & CHEM19 citations91
US7932188B2Apr 26, 2011
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
AIR PROD & CHEM9 citations84
US7470454B2Dec 30, 2008
Non-thermal process for forming porous low dielectric constant films
AIR PROD & CHEM14 citations84
US7119032B2Oct 10, 2006
Method to protect internal components of semiconductor processing equipment using layered superlattice materials
AIR PROD & CHEM14 citations84
US7581549B2Sep 1, 2009
Method for removing carbon-containing residues from a substrate
AIR PROD & CHEM18 citations83
US7591270B2Sep 22, 2009
Process solutions containing surfactants
AIR PROD & CHEM11 citations82
US7521405B2Apr 21, 2009
Process solutions containing surfactants
AIR PROD & CHEM16 citations82
US6509266B1Jan 21, 2003
Halogen addition for improved adhesion of CVD copper to barrier
AIR PROD & CHEM12 citations72
US7267842B2Sep 11, 2007
Method for removing titanium dioxide deposits from a reactor
AIR PROD & CHEM3 citations62
US7371688B2May 13, 2008
Removal of transition metal ternary and/or quaternary barrier materials from a substrate
AIR PROD & CHEM5 citations57
US8846522B2Sep 30, 2014
Materials and methods of forming controlled void
AIR PROD & CHEM1 citations52
US7434719B2Oct 14, 2008
Addition of D2 to H2 to detect and calibrate atomic hydrogen formed by dissociative electron attachment
AIR PROD & CHEM1 citations52
US6857433B2Feb 22, 2005
Process for cleaning a glass-coating reactor using a reactive gas
AIR PROD & CHEM3 citations52