Inventor
HIGURASHI HITOSHI
JP17 patents
⚠️ This page may combine multiple inventors who share the name “HIGURASHI HITOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
7 patentsUS6047116AApr 4, 2000
Method for generating exposure data for lithographic apparatus
TOSHIBA KK62 citations96
US6313476B1Nov 6, 2001
Charged beam lithography system
TOSHIBA KK56 citations95
US6566662B1May 20, 2003
Charged beam exposure system
TOSHIBA KK21 citations92
US6248508B1Jun 19, 2001
Manufacturing a circuit element
TOSHIBA KK24 citations91
US5646559AJul 8, 1997
Single-electron tunnelling logic device
TOSHIBA KK10 citations73
US6319642B1Nov 20, 2001
Electron beam exposure apparatus
TOSHIBA KK13 citations72
US5679961AOct 21, 1997
Correlation tunnel device
TOSHIBA KK14 citations69
NUFLARE TECHNOLOGY INC
7 patentsUS7592611B2Sep 22, 2009
Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam
NUFLARE TECHNOLOGY INC28 citations91
US7750324B2Jul 6, 2010
Charged particle beam lithography apparatus and charged particle beam lithography method
NUFLARE TECHNOLOGY INC12 citations83
US7504645B2Mar 17, 2009
Method of forming pattern writing data by using charged particle beam
NUFLARE TECHNOLOGY INC17 citations83
US7949966B2May 24, 2011
Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program
NUFLARE TECHNOLOGY INC8 citations82
US7698682B2Apr 13, 2010
Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus
NUFLARE TECHNOLOGY INC12 citations82
US7786453B2Aug 31, 2010
Charged-particle beam pattern writing method and apparatus with a pipeline process to transfer data
NUFLARE TECHNOLOGY INC4 citations62
US9734981B2Aug 15, 2017
Charged particle beam writing apparatus and charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations36